2023
DOI: 10.1021/acs.jpcc.3c04490
|View full text |Cite
|
Sign up to set email alerts
|

Chemical Interaction of Hydrogen Radicals (H*) with Transition Metal Nitrides

Abdul Rehman,
Robbert W. E. van de Kruijs,
Wesley T. E. van den Beld
et al.

Abstract: Transition metal nitrides (TMNs) are reported as protective coatings in reactive hydrogen environments. Although the permeation of H 2 through TMN coatings is well reported, their reducibility in H* environments is less investigated. In this work, we categorize the interaction of H* with ambient exposed TiN, ZrN, HfN, VN, NbN, and TaN thin films at 700 °C into three classes. We find that in TiN and VN samples, H*-induced reduction was limited to the surface (≈ top 2 nm). Significant denitridation was observed … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(1 citation statement)
references
References 64 publications
(131 reference statements)
0
1
0
Order By: Relevance
“…Notwithstanding, experimental and theoretical studies have provided a number of important insights. H defects have been linked to the passivation of dangling bonds within the a-Si 3 N 4 network, , based on a reduction of the observed concentration of paramagnetic centers upon increases in Si–H vs N–H concentration. , This reduction in undercoordinated Si and N has additionally been linked to the observed increase in breakdown strength and perhaps surprisingly to a decrease in the a-Si 3 N 4 film’s tensile stress . In addition, the post-deposition treatment with H leads to significant changes in the observed photoluminescence and EPR spectra. ,, The latter results suggest that H plays a dual role, leading to a reduction in midgap recombination centers while favoring or introducing others, resulting in both radiative and nonradiative recombination pathways .…”
mentioning
confidence: 99%
“…Notwithstanding, experimental and theoretical studies have provided a number of important insights. H defects have been linked to the passivation of dangling bonds within the a-Si 3 N 4 network, , based on a reduction of the observed concentration of paramagnetic centers upon increases in Si–H vs N–H concentration. , This reduction in undercoordinated Si and N has additionally been linked to the observed increase in breakdown strength and perhaps surprisingly to a decrease in the a-Si 3 N 4 film’s tensile stress . In addition, the post-deposition treatment with H leads to significant changes in the observed photoluminescence and EPR spectra. ,, The latter results suggest that H plays a dual role, leading to a reduction in midgap recombination centers while favoring or introducing others, resulting in both radiative and nonradiative recombination pathways .…”
mentioning
confidence: 99%