“…When exposed to air at elevated temperatures, Cr 1-x Al x N films form dense and adherent mixed aluminum and chromium oxide scales [1,8,9], which eventually suppress the oxygen diffusion into the bulk, providing excellent oxidation resistance up to temperatures as high as 900 • C [10][11][12], even at low Al content [13]. Current investigations seek to improve the thermal and oxidation resistance above this limit temperature by incorporation of large (substitutional) atoms, as they effectively retard diffusion related processes (recovery, decomposition and recrystallization).…”