1987
DOI: 10.1149/1.2100697
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Chemical and Electron Microprobe Analysis of Borophosphosilicate and Phosphosilicate Glasses

Abstract: Chemical and electron microprobe analysis techniques have been applied to the analysis of phosphorus and boron in low pressure chemical vapor deposited glasses on silicon. Borophosphosilicate, phosphosilicate, and borosilicate glasses were studied. An ion chromatographic analysis was developed which determines boron and phosphorus simultaneously, gives rapid analytical turnaround, and is capable of measuring as low as 0.01 weight percent of boron or phosphorus in a typical deposited glass sample. The ion chrom… Show more

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Cited by 8 publications
(4 citation statements)
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“…An established method for depositing doped oxides is the oxidation of Sill4 (4) but this process suffers from several disadvantages like an unsatisfactory step coverage or a complicated setup in the case of low pressure deposition. This has been the motivation for investigating other silicon containing compounds, the most promising candidate being tetraethylorthosilicate (49)(50)(51)(52)(53). By using this molecule, which is commonly referred to as TEOS, a variety of doped SiO~ films have been obtained at atmospheric pressure (AP) or low pressure (LP), i.e., typically below 3 torr.…”
mentioning
confidence: 99%
“…An established method for depositing doped oxides is the oxidation of Sill4 (4) but this process suffers from several disadvantages like an unsatisfactory step coverage or a complicated setup in the case of low pressure deposition. This has been the motivation for investigating other silicon containing compounds, the most promising candidate being tetraethylorthosilicate (49)(50)(51)(52)(53). By using this molecule, which is commonly referred to as TEOS, a variety of doped SiO~ films have been obtained at atmospheric pressure (AP) or low pressure (LP), i.e., typically below 3 torr.…”
mentioning
confidence: 99%
“…Some of the different analytical techniques that have been attempted, and their disadvantages are described in Ref. (30)(31)(32)(33)(34)(35).…”
Section: Borophosphosilicate Glass (Bpsg)--as Mos Device Di-mentioning
confidence: 99%
“…(a) X-ray techniques; energy dispersive X-ray fluorescence (EDX-RF) [1,3,4] and wavelength dispersive X-ray fluorescence (WDX-RF) [1,[3][4][5];…”
Section: Introductionmentioning
confidence: 99%
“…(b) inductively coupled plasma-atomic emission spectroscopy (ICP-AES) [6,8] and inductively coupled plasma-mass spectrometry (ICP-MS]) [7,9]; (c) secondary ion mass spectrometry (SIMS) [1,10,11]; (d) colorimetry [1,5]; (e) nuclear reaction analysis (NRA) [12,13]; (f) ion chromatography (IC) [5]; (g) IR and Raman vibrational spectroscopies.…”
Section: Introductionmentioning
confidence: 99%