Charging of glassy chalcogenide semiconductors in corona discharge and its effect on holographic grating formation

Holographic Recording in Corona Charged Acrylamide-Based Mfi-Zeolite Photopolymer

“…Our recent investigations 2 show that the addition of an electric corona charge seems to be a promising method for increasing the diffraction efficiency, or the sensitivity of the different types of azopolymer recording media. Similar results have been observed by Nastas et al 3 and by Reinke et al4 in their investigations of the influence of electric charge on the diffraction efficiency of holograms, recorded in thin chalcogenide films. The aim of the present paper is to investigate the influence of corona charging on holographic recording in acrylamide-based photopolymer nanocomposite containing MFI zeolite nanoparticles.…”

“…Positively or negatively charged oxygen-containing ions deposited on the sample surface, during the charging process, generate a constant electric field in the sample volume. Obviously, the electric field that is created in the case of a transmission grating recording worsens the recording in the acrylamidebased photopolymers in contrast to the chalcogenide glasses and azopolymers for which an increase of the DE has been earlier observed by Nastas et al, 3 Reinke et al, 4 Couture et al 7 and Natansohn et al 8 The addition of Si-MFI nanoparticles does not have any influence on the transmission unslanted grating recordings, but significant changes are observed in the TIR grating recordings. There are two effects that need to be considered here.…”

Studies of Ag Diffusion Processes into Thin-Film As2s3 Structures Doped With Sn under the Exposure of X-Ray Radiation

“…Photothermoplastic carriers based on As-Se-S have high values of holographic sensitivity -up to 10 6 cm 2 /J [1], resolution powerup to 4000 mm -1 [2], and diffraction efficiency -up to 40% [3][4]. Chalcogenide glassy semiconductors are sensitive materials to electron-beam recording [5][6][7] and can be used as photoresist materials sensitive in UV-visible regions with a resolution up to 7000 ln/mm [8], and photoinduced transformation (photodarkening, photorefraction) [9][10][11]. The investigations of As2S3 thin films as photoresists for X-ray photolithography were studied in work [12].…”

Effect of Corona Discharge on the Optical Properties of Thin-Film Cu–As2Se3 Structures

“…For a metal-SCG structure, a recording method in which exposition was carried out simultaneously with inscription using corona discharge was proposed in [5]. With this method, the sensitivity, diffraction efficiency, and relief depth produced using chemical etching [6] due to the LIST [7][8][9] and LIMD [10,11] effects were increased by several times. We note that the effect of corona discharge is more emphasized in thin SCG layers.…”