Abstract:Gate-pulse-induced recombination, known as the charge pumping (CP), is a fundamental carrier recombination process, and has been utilized as a method for analyzing electrical properties of defects (or dangling bonds) at the transistor interfaces, which is now recognized to be well-matured and conventional. Nevertheless, neither the origin (the bonding configuration) of the defects responsible for the CP, nor their detailed recombination sequence has been clarified yet for Si metal-oxidesemiconductor (MOS) inte… Show more
The detection of donor electrons is important for Si-based spintronics and quantum computers, as well as complementary metal–oxide–semiconductor (MOS) circuits. One of the detection schemes is based on the spin-dependent recombination, for which photoexcitation has, so far, been used to generate electrons and holes. In this study, we rather induce the recombination electrically by a gate pulse in Si MOS transistors. Under the spin resonance conditions, we detect signals from arsenic (As) donors, located in the channel edge regions close to the As-implanted source/drain. The analysis suggests that the detection is owing to the spin pairs formed by an As donor electron spin and an electron spin of a defect center at the MOS SiO2/Si interface and to their spin-dependent process during the recombination.
The detection of donor electrons is important for Si-based spintronics and quantum computers, as well as complementary metal–oxide–semiconductor (MOS) circuits. One of the detection schemes is based on the spin-dependent recombination, for which photoexcitation has, so far, been used to generate electrons and holes. In this study, we rather induce the recombination electrically by a gate pulse in Si MOS transistors. Under the spin resonance conditions, we detect signals from arsenic (As) donors, located in the channel edge regions close to the As-implanted source/drain. The analysis suggests that the detection is owing to the spin pairs formed by an As donor electron spin and an electron spin of a defect center at the MOS SiO2/Si interface and to their spin-dependent process during the recombination.
We report on electrically detected magnetic resonance (EDMR) and near-zero-field magnetoresistance (NZFMR) measurements observed through spin-dependent trap-assisted-tunneling on unpassivated Si/SiO2 metal–insulator–semiconductor capacitors comparing those containing silicon of natural isotopic abundance and silicon depleted of 29Si. Although our measurements involve monitoring the spin-dependence of the trap-assisted-tunneling current responsible for leakage across the oxide, the EDMR spectra resemble that of a combination of Pb0 and Pb1 silicon dangling bonds sites at the Si/SiO2 interface. Additionally, we observe a substantial narrowing of the NZFMR response with the removal of 29Si nuclei. The breadth of the NZFMR response is strongly influenced by hyperfine interactions. Since superhyerfine interactions between 29Si nuclei and silicon dangling bonds at the Si/SiO2 interface are a full order of magnitude stronger than such interactions involving silicon dangling bonds defects (E′ centers) within the oxide, the NZFMR results also strongly suggest a response dominated by Si/SiO2 interface trap defects. These results collectively suggest very strongly that the leakage currents that we observe involve tunneling from Si/SiO2 Pb dangling bonds to defects within the oxide. Our results thus offer fundamental insight into technologically important phenomena involving oxide leakage currents in metal–oxide–semiconductor devices such as stress induced leakage currents and time dependent dielectric breakdown.
We report on a model for the bipolar amplification effect (BAE), which enables defect density measurements utilizing BAE in metal–oxide–semiconductor field-effect transistors. BAE is an electrically detected magnetic resonance (EDMR) technique, which has recently been utilized for defect identification because of the improved EDMR sensitivity and selectivity to interface defects. In previous work, BAE was utilized exclusively in EDMR measurements. Although BAE EDMR improves the sensitivity of EDMR in studies of semiconductor/oxide interface defects, an understanding of BAE in both electrical measurements and EDMR has not yet been investigated. In this work, we develop a BAE theory based on a modified Fitzgerald–Grove surface recombination methodology, which, in theory, may be utilized to fine-tune conditions for EDMR measurements. BAE may also now be utilized as an analysis tool in purely “electronic” measurements. The model presented here may ultimately prove useful in the development of resonance-based theories of BAE EDMR.
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