2016
DOI: 10.1117/1.jatis.2.3.036003
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Charge-coupled devices detectors with high quantum efficiency at UV wavelengths

Abstract: Abstract. We report on multilayer high efficiency antireflection coating (ARC) design and development for use at UV wavelengths on CCDs and other Si-based detectors. We have previously demonstrated a set of single-layer coatings, which achieve >50% quantum efficiency (QE) in four bands from 130 to 300 nm. We now present multilayer coating designs that significantly outperform our previous work between 195 and 215 nm. Using up to 11 layers, we present several model designs to reach QE above 80%. We also demonst… Show more

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Cited by 22 publications
(19 citation statements)
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“…The quantum yield estimates from both our method and photon transfer are significantly lower than expected from an uncoated silicon interface. 20,21 Table 4 Quantum yield minimums for uncoated silicon using theoretical data by Hamden et al 18 (instead of the real measurements by Hamden et al 19 that we used in Tables 2 and 3) All QY measurements on this device have been lower than predictions from the reflectance of uncoated silicon at 150 nm. This in itself is not surprising but the QY-adjusted quantum efficiency estimates for the CIS113 at 150 nm are higher than should be possible given the reflectance of bare silicon.…”
Section: Discussionmentioning
confidence: 96%
“…The quantum yield estimates from both our method and photon transfer are significantly lower than expected from an uncoated silicon interface. 20,21 Table 4 Quantum yield minimums for uncoated silicon using theoretical data by Hamden et al 18 (instead of the real measurements by Hamden et al 19 that we used in Tables 2 and 3) All QY measurements on this device have been lower than predictions from the reflectance of uncoated silicon at 150 nm. This in itself is not surprising but the QY-adjusted quantum efficiency estimates for the CIS113 at 150 nm are higher than should be possible given the reflectance of bare silicon.…”
Section: Discussionmentioning
confidence: 96%
“…It has a line density of 2400 lines/mm and angle of incidence of 28 • . 24 The FB-2 UV EMCCD is provided by the Microdevices Laboratory (MDL) at JPL (PI: S. Nikzad [25][26][27] ) as a part of the FB-2 collaboration. A Teledyne e2v CCD201-20 wafer is thinned and δ-doped using a molecular-beam epitaxy, which grows a single layer of boron-doped silicon.…”
Section: Fireball Science Goals and Instrument Descriptionmentioning
confidence: 99%
“…A 3-layer AR coated was optimized for the FB-2 bandpass, which gave a peak QE∼65% and QE>50% across the bandpass. 25,27 Figure 2. Top, Left: The recovery team found FB-2 on one side the night after the flight.…”
Section: Fireball Science Goals and Instrument Descriptionmentioning
confidence: 99%
“…These devices are electron multiplying CCDs with 13 µm pixels in a 1k x 2k format; they are being utilized for variety of FUV imaging and spectroscopy applications at JPL. 26,27 The thinned, back-illuminated devices undergo the 2D-doping process at the wafer scale. 4 Individual devices are isolated following a pad exposure etch process which exposes the wire bond pads from the backside of the wafer prior to dicing.…”
Section: Application To Silicon Imaging Sensors At Fuv Wavelengthsmentioning
confidence: 99%