Characterizing 10 nm node based BEOL interconnects at low-frequency regime based on a transmission-line modelling approach

Abstract

The signal propagation and impedance features of back-end-of-line interconnects are analysed through the systematic processing of experimental complex impedance data. This is achieved by proposing an equivalent circuit that accounts for the distribution of resistive and capacitive elements on the considered structure. In this regard, due to the relatively long length of the test structures typically used to assess the performance of these interconnects, the corresponding phase delay and attenuation that becomes apparent under AC stimuli need to be considered. Hence, transmission line theory is applied here for maintaining the modelling approach simple but still physical. Accurate results are achieved when correlating simulated with experimental data when using the extracted model parameters.