1987
DOI: 10.1016/0040-6090(87)90008-3
|View full text |Cite
|
Sign up to set email alerts
|

Characterization of titanium silicide films formed by composite sputtering and rapid thermal annealing

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

0
4
0

Year Published

1989
1989
2013
2013

Publication Types

Select...
4
1

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(4 citation statements)
references
References 6 publications
0
4
0
Order By: Relevance
“…The EDX analysis of these nanostructures (inset of Figure c) confirms the presence of Ti and Si with an approximate atomic ratio of 1:2. The oxygen was introduced into the deposited layer, as shown in the EDX spectrum through the residual oxygen in the chamber suggested in previous reports. A closer observation of the composite nanostructures (Figure d) shows that the TiSi 2 O x coating has particle-like morphology, which is common during sputtering on nanostructured materials at room temperature. , …”
Section: Resultsmentioning
confidence: 56%
See 3 more Smart Citations
“…The EDX analysis of these nanostructures (inset of Figure c) confirms the presence of Ti and Si with an approximate atomic ratio of 1:2. The oxygen was introduced into the deposited layer, as shown in the EDX spectrum through the residual oxygen in the chamber suggested in previous reports. A closer observation of the composite nanostructures (Figure d) shows that the TiSi 2 O x coating has particle-like morphology, which is common during sputtering on nanostructured materials at room temperature. , …”
Section: Resultsmentioning
confidence: 56%
“…The HRTEM image of TiSi 2 O x -NCNT composite nanostructures (Figure d) illustrates their amorphous nature. The SAED pattern shows diffused rings (inset of Figure d), further confirming their amorphous nature …”
Section: Resultsmentioning
confidence: 65%
See 2 more Smart Citations