2007
DOI: 10.1063/1.2714689
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Characterization of the morphology and optical properties of InAs∕AlAs quantum dots with a GaAs insertion layer

Abstract: InAs self-assembled quantum dots by utilizing a thin GaAs insertion layer (IL) on a 1nm thick AlAs seed layer were grown on GaAs(100) substrates by using a molecular beam epitaxy technique. InAs quantum dots (QDs) were formed by varying the thickness of the GaAs IL from 1 to 9 ML (monolayer), and their morphological and optical properties were characterized by atomic force microscopy and photoluminescence (PL). As a result, when the GaAs IL was thicker than 5 ML, normal InAs QDs with an average diameter of 30n… Show more

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Cited by 5 publications
(5 citation statements)
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“…The epitaxial layers were grown on a (1 0 0) semi-insulating GaAs substrate using MBE. Details of MBE growth and device fabrication were reported in [20,21]. A cross-sectional view of the device is shown in figure 1.…”
Section: Methodsmentioning
confidence: 99%
See 2 more Smart Citations
“…The epitaxial layers were grown on a (1 0 0) semi-insulating GaAs substrate using MBE. Details of MBE growth and device fabrication were reported in [20,21]. A cross-sectional view of the device is shown in figure 1.…”
Section: Methodsmentioning
confidence: 99%
“…On the other hand, for GaAsbased PDs, the comparative study between passivation types has been hardly presented for the qualitative and quantitative characteristics of the reverse dark current owing to its limitation of demands and usefulness. However, its performance has become more important in recent years because PD/LED or PD/VCSEL monolithic devices based on GaAs have attracted great interest because of the various optical communicative applications, for example free-space optical interconnect, smart pixel and bio-medical analysis system [16][17][18][19][20][21][22][23][24]. Especially, as these monolithic devices become a one-dimensional or two-dimensional array and their pixel numbers are increased, the research for the surface passivation/leakage current becomes more important because the etched surface is exposed with a larger area and further acts as a dominant noise source.…”
Section: Introductionmentioning
confidence: 99%
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“…The epitaxial layers were grown on a (1 0 0) semi-insulating GaAs substrate using MBE. Details of MBE growth and fabrication are similar to those discussed in [16,17]. The devices contain the SACM APD structure between bottom mirrors and passivation layers.…”
Section: Methodsmentioning
confidence: 99%
“…To examine the passivation effect, we applied the different passivation processes, one of which is polyimide and the other is SiN x , into the InAs QDs/GaAs SACM APDs. These devices could be used as PDs with low noise, high speed and high wavelength selectivity, and monolithically integrated with VCSELs or LEDs at a wavelength of ∼1 μm [15][16][17]. In this paper, we focus on the passivation effect on surface current.…”
Section: Introductionmentioning
confidence: 99%