Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Mohite, K. C.; Khollam, Y. B.; Mandale, A.B.; Patil, K.R.; Takwale, M.G.

doi:10.1016/s0167-577x(03)00284-2

Cited by 36 publications

(29 citation statements)

References 18 publications

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“…The main binding energy of Si2p obtained from Si-N-O film deposited at 5 sccm was 99.8 eV, and it shifted to 102.1 eV when N 2 flow changed to 20 sccm, a shift of 2.3 eV. Three symmetry peaks with binding energies of 99.7 eV, 101.4 eV and 102.7 eV (corresponding to Si, Si 3 N 4 and SiO x (x≤2) [14][15][16], respectively) could be found from the Si2p spectra obtained from Si-N-O film deposited at 5 sccm, but only two symmetry peaks with binding energies of 101.8 eV and 102.9 eV (corresponding to Si 3 N 4 and SiO x (x≤2) [17,18], respectively) could be found when N 2 flow changed from 5 sccm to 20 sccm.…”

Section: Xps Analysissmentioning

confidence: 96%

Preparation of micro-patterned surfaces of Si-N-O films and their influence on adhesion behavior of endothelial cells

Zheng

Yang

Wang

et al. 2010

Sci. China Ser. E-Technol. Sci.

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Microgrooves were prepared on Si (100) surface by photolithography and wet etching. Subsequently, Si-N-O films were deposited on the microgrooves by unbalanced magnetron sputtering (UBMS) and micro-patterned surfaces of Si-N-O films were obtained. The size of the micropatterns was measured by surface profilometer. The chemical composition of Si-N-O films were characterized by X-ray photoelectron spectrometry (XPS) and the wettability of the micropatterned surfaces was evaluated by contact angle measurement. The behavior of endothelial cells adhered on the micro-patterned surfaces, including cells adhesion, proliferation and orientation, was evaluated by cell culture test and Alamar blue assay. The results showed that the amount and activity of endothelial cells on micro-patterned samples were higher than those on flat samples. After one day's incubation, the cells were well guided along the microgrooves. Three days later, most of the cells grew across the grooves and contacted each other. Their activity was also much higher than that on flat samples. It was suggested that the adhesion and proliferation of endothelial cells could be effectively enhanced by micropattern method. micropatterns, Si-N-O film, endothelial cell, unbalanced magnetron sputtering Citation: Zheng N, Yang P, Wang Q Y, et al. Preparation of micro-patterned surfaces of Si-N-O films and their influence on adhesion behavior of endothelial cells.

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Section: Xps Analysissmentioning

confidence: 96%

Preparation of micro-patterned surfaces of Si-N-O films and their influence on adhesion behavior of endothelial cells

Zheng

Yang

Wang

et al. 2010

Sci. China Ser. E-Technol. Sci.

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“…Vanadium oxide coatings prepared by dip coating enhance light transmittance after lyophilization [86] . TiO 2 nanotexture [87] coatings used as cover cells prepared by dip coating (6mm/sec) gives optical transmittance with self-cleaning ability applicable in PV cells. The major disadvantage of this technique includes the slow fabrication process, in comparison with other methods.…”

Section: E-issn: 2321-6212 P-issn: 2347-2278mentioning

confidence: 99%

A Mini Review: Antireflective Coatings Processing Techniques, Applications and Future Perspective

Khan¹,

Wu²,

Pan³

et al. 2017

Res. Rev. J Mat. Sci

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Antireflective coatings (AR) are widely applied to eliminate the unwanted surface reflections from the AR coated substrate. In different optoelectronic devices, AR coatings have potential usage in photovoltaic solar cells, sensors, display devices, automobile industries to reduce reflectance, glare and enhance light transmittance. Natural phenomenon inspires researchers, and they generate bionic AR coatings copying the nature such as moth eyes, or cicada wings to fabricate efficient light harvesting AR coatings. In the current review article, we analyse and evaluate critically the progress and recent development in the fabrication of AR thin films comprising organic coatings, inorganic coatings, polymer AR coatings and bionic AR coatings. We predominantly emphasise the AR coatings fabrication by different methods and pinpoints the technological challenges in their real-world reliability. Finally, we address the future challenges and potential strategies for their upcoming prospect.

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“…The presence of oxygen contamination my arise from the oxidation of some Si powder by air exposure, the residual water in the coating unit's jar and the adsorbed oxygen or the hydroxyl molecules on the surface of the film after it got out of the evaporation chamber or rf plasma reactor tube. Nitrogen can be incorporated into Si using nitridation by energetic rf nitrogen plasmas [7,18]. This nitridation method can be performed at low temperatures ≈ 25-500…”

Section: Structural Properties 311 Film Composition and Thicknessmentioning

confidence: 99%

“…• C [7]. As the surface of the Si film is subjected to nitrogen plasma, the nitrogen ions are incorporated into the surface region.…”

Section: Structural Properties 311 Film Composition and Thicknessmentioning

confidence: 99%

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Properties of Rf Plasma Nitrided Silicon Thin Films at Different Rf Plasma Processing Powers

et al. 2011

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Nitrided surfaces and composition gradients in thin films exhibit interesting mechanical, electrical and optical properties. Therefore, silicon (Si) thin films were prepared by electron beam evaporation and nitrided by an inductively coupled rf plasma. The effects of successive plasma processing power on structural and optical properties as well as electrical resistivity were examined by different characterization techniques. The Si thin films were transformed gradually into nitrides compound thin films and the amount of nitrogen in the film increased with increasing the rf processing power. The Si nitrided films showed structural, optical and electrical properties that depend on the nitriding power. Increasing the rf plasma processing power caused amorphization, reduced the thickness, increased transmittance, increased resistivity and decreased the reflectance of the Si films. The electrical resistivity increased about eight orders of magnitude when the sample nitrided at 500 W. Different optical band gap were determined indicating the presence of different competing phases in the same film. The decrease in refractive index with plasma treatment power is attributed to the possible change in the bucking density as well as to the increase in the band gap.

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Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Cited by 36 publications

References 18 publications

Preparation of micro-patterned surfaces of Si-N-O films and their influence on adhesion behavior of endothelial cells

Preparation of micro-patterned surfaces of Si-N-O films and their influence on adhesion behavior of endothelial cells

A Mini Review: Antireflective Coatings Processing Techniques, Applications and Future Perspective

Properties of Rf Plasma Nitrided Silicon Thin Films at Different Rf Plasma Processing Powers

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