2004
DOI: 10.1063/1.1695443
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Characterization of Si/GexSi1−x structures by micro-Raman imaging

Abstract: Ge x Si 1−x are characterized by Raman microspectroscopy. The strain of the 17.5-nm-thick Si layer was examined through deep UV Raman measurements. The depth profile of the GexSi1−x alloy composition and crystallinity was determined by visible Raman image measurement of the sample cross section. These measurements give results consistent with transmission electron microscopy and secondary ion mass spectrometry analyses.

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Cited by 51 publications
(39 citation statements)
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“…Raman analysis has been shown (6) to be a very useful tool in the characterisation of materials, including nanomaterials (7) . It is a relatively fast and completely non-destructive technique that depends on the inelastic scattering of light in order to extract information from the material under investigation.…”
Section: Preparationmentioning
confidence: 99%
“…Raman analysis has been shown (6) to be a very useful tool in the characterisation of materials, including nanomaterials (7) . It is a relatively fast and completely non-destructive technique that depends on the inelastic scattering of light in order to extract information from the material under investigation.…”
Section: Preparationmentioning
confidence: 99%
“…They run from basic inspection of as-grown semiconductors to advanced device inspection tools. For instance, Raman mapping enables to check the crystalline quality [6,7], the composition [8,9], the doping level [10-13], or the uniformity of as-grown semiconductor materials. Along this line one on the most popular applications in microelectronics is strain measurements, either at the device or at the full wafer scale [9,14-17].…”
Section: Introductionmentioning
confidence: 99%
“…That is why a technique to characterize strain with sub-100 nm resolution reliably is high in demand. Micro-Raman spectroscopy has been a popular for strain measurements because it is non-destructive and straightforward [19][20][21] . Compressive strain will shift the Raman peak to higher frequency, while the tensile strain will shift it to lower frequency.…”
Section: Resultsmentioning
confidence: 99%