2017
DOI: 10.1016/j.surfcoat.2016.11.064
|View full text |Cite
|
Sign up to set email alerts
|

Characterization of photocatalytic, wetting and optical properties of TiO 2 thin films and demonstration of uniform coating on a 3-D surface in the mass transport controlled regime

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

2
20
0
2

Year Published

2017
2017
2021
2021

Publication Types

Select...
7
1

Relationship

2
6

Authors

Journals

citations
Cited by 21 publications
(24 citation statements)
references
References 50 publications
2
20
0
2
Order By: Relevance
“…The pattern also shows that the anatase phase exhibits a strong [220] growth texture. This is consistent with previous studies of pp-MOCVD films [14,18,20,27].…”
Section: Phase and Composition Of Tio2 Coatings Prepared By Pp-mocvdsupporting
confidence: 94%
See 1 more Smart Citation
“…The pattern also shows that the anatase phase exhibits a strong [220] growth texture. This is consistent with previous studies of pp-MOCVD films [14,18,20,27].…”
Section: Phase and Composition Of Tio2 Coatings Prepared By Pp-mocvdsupporting
confidence: 94%
“…Solvent and reactant product vapors are evacuated into a liquid N 2 cold trap. At high temperatures (>500 • C) the reactor works in the mass-transport controlled regime with high precursor-arrival rate to the substrate surface during the peak of the pressure pulse [20]. The pulsed-pressure cycle is typically 6 seconds with less than 0.5 seconds of pressure rise, and 5 seconds of pump-down [21].…”
Section: Pulsed-pressure Mocvd Technologymentioning
confidence: 99%
“…It can be observed as a dense film with columnar structure (Figure 6b). Results presented by Krumdieck et al [48] showed that the increase of the thickness of the films caused a decreased of the roughness, similar trend with the values exhibited in the present work. The results clearly show that the increase of the growth time ( Table 1) caused an increase in the film thickness, as evidenced by Antunes et al [49].…”
Section: Titanium Dioxide -Materials For a Sustainable Environment 216supporting
confidence: 92%
“…Metalorganic chemical vapor deposition technique (MOCVD), a specific area of CVD, is an attractive process for the growth of TiO 2 films, since it provides improvements in uniformity, presents high growth rates, allows the coating of substrates with complex geometries, and increases the range of substrates used, because in this process lower growth temperatures are used comparing to conventional CVD. [12][13][14] MOCVD process also allows a good control of the films thickness during their growth, promoting the…”
Section: Introductionmentioning
confidence: 99%