Characterization of mixed yttria and zirconia thin films

Marinova, Ts.; Tsanev, A.; Stoychev, D.

doi:10.1016/j.mseb.2005.11.008

Cited by 5 publications

(3 citation statements)

References 32 publications

(29 reference statements)

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“…[24][25][26] The Y/Zr ratio, determined by the Y 3d and Zr 3d peaks and corrected for sensitivity factors is 0?21. This corresponds to the Y/Zr bulk ratio of the YSZ target material used.…”

Section: X-ray Diffractionmentioning

confidence: 99%

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Development of very thin YSZ films deposited on substrates of varying porosity by e-beam evaporation

Σόμπολος

Yianoulis

2012

Surface Engineering

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We present results of our efforts to develop thin films that may prove to be appropriate solid electrolytes for lower operating temperature solid oxide fuel cells. The electron beam evaporation technique has been used to deposit yttrium stabilised zirconia (YSZ: ZrO 2 stabilised with 8 wt-%Y 2 O 3 ) thin films on a variety of porous and non-porous substrates. Thin films have been grown on conducting films on glass, monocrystalline silicon wafers and highly porous NiO/YSZ substrates. Some of the porous substrates have been polished in order to be able to support thinner films. Films ranging from 0?2 to 2 mm in thickness have been manufactured. Submicrometre thin films have successfully been deposited on NiO/YSZ polished substrates. Operating technical parameters that influence the film properties were studied and the influence of substrate structure and deposition rate has been investigated. The film thickness has been measured in situ via a quartz crystal monitor and ex situ by a stylus profilometer. The morphology of the films has been studied by scanning electron microscopy. Samples have also been investigated in terms of chemical composition via X-ray photoelectron spectroscopy. Using the Scotch tape test, it has been found that the films exhibited good adhesive qualities; however, in some occasions, when annealed, cracks appeared. Using a polished -hence smoothersubstrate has reduced the occurrence of cracks and other abnormalities. The electron gun power -and subsequently the rate of deposition -played an important role in film morphology. The latter presented an interesting crystallite structure in the nanometre range.

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“…[24][25][26] The Y/Zr ratio, determined by the Y 3d and Zr 3d peaks and corrected for sensitivity factors is 0?21. This corresponds to the Y/Zr bulk ratio of the YSZ target material used.…”

Section: X-ray Diffractionmentioning

confidence: 99%

“…The same splitting effect is present in the Y 3d spectrum (two peaks at 159?3 and 161?4 eV), also in accordance with literature. [24][25][26] The Y/Zr ratio, determined by the Y 3d and Zr 3d peaks and corrected for sensitivity factors is 0?21. This corresponds to the Y/Zr bulk ratio of the YSZ target material used.…”

Section: X-ray Photoelectron Spectroscopymentioning

confidence: 99%

Development of very thin YSZ films deposited on substrates of varying porosity by e-beam evaporation

Σόμπολος

Yianoulis

2012

Surface Engineering

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show abstract

“…All these can be used to reduce the rate of general corrosion, pitting and crevice corrosion as well as stress corrosion (Breslin et al, 1997;Lu & Ives, 1993. The oxide films of rare-earth elements and refractory compounds can be formed mostly by means of chemical or electrochemical methods (Amelinckx et al, 2006a(Amelinckx et al, , 2006bAvramova et al, 2005;Balasubramanian et al, 1999;Di Maggio et al, 1997;Marinova et al, 2006;Montemor et al, 2001Montemor et al, , 2002Schmidt et al, 1997;Stefanov et al, 2000aStefanov et al, , 2000bStefanov et al, , 2004aStefanov et al, , 2004bStoychev et al, 2000Stoychev et al, , 2003Stoychev et al, , 2004Tsanev et al, 2008;Tyuliev et al, 2002;Valov et al, 2002;Zheludkevich et al, 2005). It is supposed that cerium oxide/ hydroxide formation is the main reason for the corrosion protection property of cerium compounds.…”

Section: Introductionmentioning

confidence: 99%