2003
DOI: 10.1016/s0022-0248(02)02431-4
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Characterization of MBE grown II–VI semiconductor thin layers by X-ray interference

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Cited by 17 publications
(19 citation statements)
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“…At this temperature, little of the impinging Zn flux is incorporated into the growing layer. Initial characterisation of these structures was by X-ray Interference (XRI) measurements of multilayers of the form ZnSe (50 nm) / MgS / ZnSe (50 nm) [15]. In these structures, the thin MgS layer, which has a different lattice constant from the ZnSe, causes strong modulation of the X-ray diffraction patterns.…”
mentioning
confidence: 99%
“…At this temperature, little of the impinging Zn flux is incorporated into the growing layer. Initial characterisation of these structures was by X-ray Interference (XRI) measurements of multilayers of the form ZnSe (50 nm) / MgS / ZnSe (50 nm) [15]. In these structures, the thin MgS layer, which has a different lattice constant from the ZnSe, causes strong modulation of the X-ray diffraction patterns.…”
mentioning
confidence: 99%
“…First, a set of GaAs/ZnSe (50 nm)/ZnMgSSe (d nm)/ZnSe (50 nm) samples were grown with d varied from 6 to 17 nm for analysis by X-ray interference (XRI) [12,13]. The thicknesses of the layers in these samples were such that they could be compared directly with an almost identical set of samples grown previously for analysis of ZnSe/MgS/ZnSe layers by XRI [6,14].…”
Section: Methodsmentioning
confidence: 99%
“…In order to determine the lattice parameter of ZB CrS, a series of samples containing Mn 1-x Cr x S layers were grown for X-Ray Interference (XRI) [7] measurements. The samples all had the same structure, GaAs (sub)/ZnSe/MnCrS/ZnSe.…”
Section: Growth Proceduresmentioning
confidence: 99%