Characterization of Magnetron Sputtered BiTe-Based Thermoelectric Thin Films

Zhang, Zhenxue; Gurtaran, Mikdat; Li, Xiaoying; Un, Hio‐Ieng; Qin, Yi; Dong, Hanshan

doi:10.3390/nano13010208

Cited by 3 publications

(1 citation statement)

References 36 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Due to the convenient process tuning and low coating temperature, magnetron sputtering is widely employed in manufacturing semiconductor, photo-electronic, and thermoelectric thin film devices [1][2][3]. The film thickness uniformity, as a critical index, significantly determines the performance consistency of film devices [4].…”

Section: Introductionmentioning

confidence: 99%

Evolution Mechanism of Sputtered Film Uniformity with the Erosion Groove Size: Integrated Simulation and Experiment

Zhu,

Yang,

Xiao

et al. 2023

Molecules

View full text Add to dashboard Cite

In this work, Cu thin films were experimentally fabricated at different target–substrate distances by 2-inch and 4-inch circular planar magnetron targets. Meanwhile, the sputtering deposition of Cu thin films was investigated via an integrated multiscale simulation, where the magnetron sputtering discharge was modeled using the Monte Carlo (MC) method, and the sputtered particle transport was simulated using a coupled Monte Carlo (MC) and molecular dynamics (MD) method. Experimental results indicated that, as the target–substrate distance increased from 30 to 120 mm, the film thickness distribution of the 2-inch target sputtering changed from a bell-shaped curve to a line-shaped curve, while that of the 4-inch target sputtering varied from a saddle-shaped curve to a line-shaped curve. The simulation results were accordant with the experimental results. The simulation results revealed that, at a target–substrate distance of 30 mm, the sputtering particle flow from the 2-inch target overlapped strongly near the substrate center, leading to a bell-shaped film thickness distribution, while the increased diameter of the erosion groove on the 4-inch target reduced the superposition effect of the sputtering particle flow near the substrate center, resulting in a saddle-shaped film thickness distribution. In addition, when the target–substrate distance ranged from 30 to 120 mm, the film thickness uniformity of 4-inch target sputtering was superior to that of 2-inch target sputtering, and the underlying mechanism was discussed in detail.

show abstract

Section: Introductionmentioning

confidence: 99%

Evolution Mechanism of Sputtered Film Uniformity with the Erosion Groove Size: Integrated Simulation and Experiment

Zhu,

Yang,

Xiao

et al. 2023

Molecules

View full text Add to dashboard Cite

show abstract

Enhancement of the thermoelectric performance of (BiSb)2Te3 films by single target sputtering

Zhang,

Jiang,

2024

Ceramics International

View full text Add to dashboard Cite

Nanostructured Thermoelectric PbTe Thin Films with Ag Addition Deposited by Femtosecond Pulsed Laser Ablation

et al. 2023

View full text Add to dashboard Cite

Pulsed laser deposition operated by an ultra-short laser beam was used to grow in a vacuum and at room temperature natively nanostructured thin films of lead telluride (PbTe) for thermoelectric applications. Different percentages of silver (Ag), from 0.5 to 20% of nominal concentration, were added to PbTe deposited on polished technical alumina substrates using a multi-target system. The surface morphology and chemical composition were analyzed by Scanning Electron Microscope and X-ray Photoelectron Spectroscopy, whereas the structural characteristics were investigated by X-ray Diffraction. Electrical resistivity as a function of the sample temperature was measured by the four-point probe method by highlighting a typical semiconducting behavior, apart from the sample with the maximum Ag concentration acting as a degenerate semiconductor, whereas the Seebeck coefficient measurements indicate n-type doping for all the samples. The power factor values (up to 14.9 µW cm−1 K−2 at 540 K for the nominal 10% Ag concentration sample) are competitive for low-power applications on flexible substrates, also presuming the achievement of a large reduction in the thermal conductivity thanks to the native nanostructuring.

show abstract

Characterization of Magnetron Sputtered BiTe-Based Thermoelectric Thin Films

Cited by 3 publications

References 36 publications

Evolution Mechanism of Sputtered Film Uniformity with the Erosion Groove Size: Integrated Simulation and Experiment

Evolution Mechanism of Sputtered Film Uniformity with the Erosion Groove Size: Integrated Simulation and Experiment

Enhancement of the thermoelectric performance of (BiSb)2Te3 films by single target sputtering

Nanostructured Thermoelectric PbTe Thin Films with Ag Addition Deposited by Femtosecond Pulsed Laser Ablation

Contact Info

Product

Resources

About