1995
DOI: 10.1016/0257-8972(95)08214-x
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Characterization of low temperature CrN and TiN (PVD) hard coatings

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Cited by 92 publications
(31 citation statements)
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“…However, a good adhesion of the coating to the substrate is essential for a successful application [1]. Hard coatings fabricated by habitual physical vapor deposition have a poor film quality due to porous microstructure and weak adhesion [2]. Also, adhesion problems related to the different thermal expansion coefficients of the coating and substrate material were also observed [3].…”
Section: Introductionmentioning
confidence: 99%
“…However, a good adhesion of the coating to the substrate is essential for a successful application [1]. Hard coatings fabricated by habitual physical vapor deposition have a poor film quality due to porous microstructure and weak adhesion [2]. Also, adhesion problems related to the different thermal expansion coefficients of the coating and substrate material were also observed [3].…”
Section: Introductionmentioning
confidence: 99%
“…The TiN layers grow in a Ðne-grained polycrystalline columnar structure with a 15È20 nm column width that was determined by crosssection transmission electron microscopy (TEM). 23 The reason why the samples were prepared in this way instead of depositing the TiN coatings on massive iron is that the possible Fe bulk contribution to the ICEM spectra in the corroded samples is minimized, thus enhancing the contribution of the species formed at the TiN/Fe interface.…”
Section: Methodsmentioning
confidence: 99%
“…Reference coatings show columnar growth with increasing grain size toward the film surface. The average column width varies between 15 nm for NbN and 150 nm for CrN, 56 as summarized in Table I. Both CrN and TiN have columns extending through the entire film thickness, but TiN shows highangle boundaries whereas CrN has low-angle boundaries columns.…”
Section: A Microstructure Of the Investigated Thin Filmsmentioning
confidence: 99%