Characterization of LaF3 coatings prepared at different temperatures and rates

Electron beam evaporated LaF3 thin films prepared by different temperatures and deposition rates

“…At last the LIDT at wavelength of 355 nm of the films was tested by a tripled Nd:YAG laser system [3] at a pulse width of 12 ns, the diameter of the laser beam was 0.45 mm. 1 1), (3 0 2) and (2 2 1).…”

“…Traditionally, LaF 3 thin films were always prepared by resistive heating (RH) boat method and excellent films with low optical loss and high LIDT were produced by this method [1][2][3], But impurities are always introduced because of the reaction between the original material and boat material (Mo, Ta, W, etc.) [4], the impurities are always the inclusion of absorption, and so the LIDT of the films decrease.…”

“…LaF 3 is a very important optical material widely used for UV-DUV-VUV coatings region due to its wide band gap and relative high refractive index [1][2][3][4][5][6]. Traditionally, LaF 3 thin films were always prepared by resistive heating (RH) boat method and excellent films with low optical loss and high LIDT were produced by this method [1][2][3], But impurities are always introduced because of the reaction between the original material and boat material (Mo, Ta, W, etc.)…”

Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors

“…[4] Another application, a Pt/LaF 3 gas sensor based on Pt and LaF 3 layers acting as the chemically sensitive components, has been used for the detection of fluorine, hydrogen fluoride, fluorocarbons, and oxygen. [14,15] The most often used techniques for depositing LaF 3 thin films have been physical vapor deposition (PVD) methods, e.g., electron-beam evaporation (EBE), [4,11,[16][17][18][19][20][21][22] ion-assisted deposition, [5,7,13,23] thermal evaporation, [3,[6][7][8]12,16,18,[24][25][26][27][28][29][30][31][32][33][34] ionbeam sputtering, [7,18,28] radio frequency magnetron sputtering, [35,36] and molecular beam epitaxy. [37][38][39][40][41] Only a few CVD methods have been used for depositing LaF 3 thin films, i.e., pyrolysis of a single source precursor La(hfa) 3 diglyme complex (hfa ¼ hexafluoroacetylacetonate), [42] or by using HF or...…”

Enhanced Mechanical Properties of LaF<SUB>3</SUB> Thin Films by Ion Plating Deposition

“…It has been reported that the laser resistance of RH film was improved by RH deposition. 1) However, aging and thermal reliabilities are still quite low because of columnar structures and grain boundaries.…”