2019
DOI: 10.1007/s10854-019-02286-w
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Characterization of GZO thin films fabricated by RF magnetron sputtering method and electrical properties of In/GZO/Si/Al diode

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Cited by 9 publications
(1 citation statement)
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“…The barrier height value found for high temperature region is very close to the band gap of Si, while the one found for low temperature region is lower than the known the band gap of Si. Therefore, varying barrier height values for different temperature regions are associated with lateral barrier inhomogeneity at the metal semiconductor interface [37][38][39]. This instance demonstrates that thermionic emission (TE) controls current transport at temperatures over 180 K, whereas thermionic field emission (TFE) controls current transport at temperatures below 160 K [1,2,[40][41][42].…”
Section: Resultsmentioning
confidence: 99%
“…The barrier height value found for high temperature region is very close to the band gap of Si, while the one found for low temperature region is lower than the known the band gap of Si. Therefore, varying barrier height values for different temperature regions are associated with lateral barrier inhomogeneity at the metal semiconductor interface [37][38][39]. This instance demonstrates that thermionic emission (TE) controls current transport at temperatures over 180 K, whereas thermionic field emission (TFE) controls current transport at temperatures below 160 K [1,2,[40][41][42].…”
Section: Resultsmentioning
confidence: 99%