Characterization of diamond-like carbon thin film synthesized by RF atmospheric pressure plasma Ar/CH4 jet

Sohbatzadeh, Farshad; Safari, R.; Etaati, G. R.; Asadi, Ehsan; Mirzanejhad, Saeed; Hosseinnejad, Mohammad Taghi; Samadi, Omid; Bagheri, Hanieh

doi:10.1016/j.spmi.2015.11.016

Cited by 18 publications

(19 citation statements)

References 43 publications

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“…To obtain information about radical generation, we measured the optical emission spectroscopy (OES) spectra of the discharges. Figure 4 shows a typical OES spectrum, in which un-ionized argon (Ar I), hydrogen (Balmer lines, H α at 656 nm, H β at 486 nm, and Hγ at 434 nm), hydrogen molecules (H 2 ), and CH* radicals (432.6 nm) are emitted from the discharge [24][25][26][27][28][29][30]. Figure 5 shows the pressure dependence of the emission intensity of CH* (432.6 nm).…”

Section: Resultsmentioning

confidence: 99%

Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition

Hwang

Kamataki

Itagaki

et al. 2019

Plasma and Fusion Research

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Using an Ar + CH 4 multi-hollow discharge plasma chemical vapor deposition (MHDPCVD) method, carbon nanoparticles (CNPs) are synthesized in a size range between 10 nm and 100 nm at gas pressures from 2 Torr to 5 Torr. The size of the nanoparticles increases from 45.42 nm 3 at 2 Torr to 67.85 nm 3 at 5 Torr. The size dispersion also increases. Conversely, the optical emission intensities and generation of carbon related radicals decrease with increasing pressure. The Raman measurements indicate that these CNPs are composed of polymer structures containing relatively high clustered and distorted sp2 sites.

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Section: Resultsmentioning

confidence: 99%

Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH4 Multi-Hollow Discharged Plasma Chemical Vapor Deposition

Hwang

Kamataki

Itagaki

et al. 2019

Plasma and Fusion Research

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“…Sohbatzadeh et al. [ 132 ] synthesized DLC thin films by a radio frequency atmospheric pressure plasma jet (RF‐APPJ) under a CH 4 /Ar atmosphere. The ratio of the intensity of the D:G Raman bands, I D / I G , was 0.47, revealing higher content of sp 3 hybridized carbon.…”

Section: Effect Of Discharge Gas On Cbmsmentioning

confidence: 99%

Advance in Using Plasma Technology for Modification or Fabrication of Carbon‐Based Materials and Their Applications in Environmental, Material, and Energy Fields

Sun

Bao

et al. 2020

Adv Funct Materials

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Plasma technology is an eco‐friendly way to modify or fabricate carbon‐based materials (CBMs) due to plasmas’ distinctive abilities in tuning the surface physicochemical properties by implanting functional groups or incorporating heteroatoms into the surface without changing the bulk structure. However, the mechanisms of functional groups formation on the carbon surface are still not clearly explained because of the variety of different discharge conditions and the complexity of plasma chemistry. Consequently, this paper contains a comprehensive review of plasma‐treated carbon‐based materials and their applications in environmental, materials, and energy fields. Plasma‐treated CBMs used in these fields have been significantly enhanced in recent years because these related materials possess unique features after plasma treatment, such as higher adsorption capacity, enhanced wettability, improved electrocatalytic activity, etc. Meanwhile, this paper also summarizes possible reaction routes for the generation of functional groups on CBMs. The outlook for future research is summarized, with suggestions that plasma technology research and development shall attempt to achieve precise control of plasmas to synthesize or to modify CBMs at the atomic level.

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“…Raman spectroscopy is a technique widely used to characterize DLC coatings and other carbon-based mate rials 23,29 . This analysis allows evaluating chemical structure of the films, identify D and G band peak positions, determine I D / I G ratio, and the width of half of band G (FWHM(G)) a useful tool to correlate mechanical, adhesion, tribological, and corrosion behavior with the DLC coatings deposition conditions 23,30,31 .…”

Section: Characterizationmentioning

confidence: 99%

Study of the Effect of Nitrogen on Corrosion, Wear resistance and Adhesion Properties of DLC Films Deposited on AISI 321H

Almeida¹,

Pereira²,

Antônio³

et al. 2022

Mat. Res.

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The deposition of DLC films on 321H stainless steel aims at attributing properties such as high wear resistance and low friction coefficient to the substrate material. Nitrogen added to DLC can improve the film adhesion to metal substrates, but the investigation of its effect on corrosion resistance, an important property for stainless steels, is lacking. The DLC film was deposited by plasma-enhanced chemical vapor deposition (PECVD) using a pulsed-DC power supply with a gas mixture of Ar and CH 4 , and to the DLC(N) film deposition was used CH 4 and N 2 varying the percentage of nitrogen from 10 to 50% in the treatment. DLC films improved both the wear and corrosion resistance of 321H stainless steel. The results show that the 10, 20 and 30% of N 2 supply during the deposition increased the adhesion of the film on the substrate, enhancing the wear resistance of the treated material. The addition of 40 and 50% of N 2 during the deposition, however, impaired the corrosion resistance compared with the substrate. An improvement of adhesion, wear and corrosion resistance were observed for 30% N 2 condition. Thus, the incorporation of suitable concentration of nitrogen modifies the features of the DLC film, obtaining a good combination of high wear resistance and corrosion protection due to a combination of structure, high thickness, and high adhesion of the film to 321H stainless steel.

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Characterization of diamond-like carbon thin film synthesized by RF atmospheric pressure plasma Ar/CH4 jet

Cited by 18 publications

References 43 publications

Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH<sub>4 </sub>Multi-Hollow Discharged Plasma Chemical Vapor Deposition<sup> </sup>

Effects of Gas Pressure on the Size Distribution and Structure of Carbon Nanoparticles Using Ar + CH<sub>4 </sub>Multi-Hollow Discharged Plasma Chemical Vapor Deposition<sup> </sup>

Advance in Using Plasma Technology for Modification or Fabrication of Carbon‐Based Materials and Their Applications in Environmental, Material, and Energy Fields

Study of the Effect of Nitrogen on Corrosion, Wear resistance and Adhesion Properties of DLC Films Deposited on AISI 321H

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