Characterization of Diamond-like Carbon (DLC) films deposited by RF ICP PECVD method

Oleszkiewicz, W.; Kijaszek, Wojciech; Gryglewicz, J.; Zakrzewski, A.; Gajewski, Krzysztof; Kopiec, Daniel; Kamyczek, P.; Płaczek‐Popko, E.; Tłaczała, M.

doi:10.1117/12.2031066

Cited by 5 publications

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“…The investigated DLC films were deposited by RF ICP PECVD method on silicon substrates [11,12]. The films were deposited on polished and textured 10 mm × 10 mm square silicon substrates located on 2" silicon transport plate.…”

Section: Methodsmentioning

confidence: 99%

“…The DLC films with different bonding configurations (sp 3 around 35 %, 50 % and 70 %) were deposited on polished and textured substrates. The sp 3 fraction content of the DLC films was controlled by the power value of the applied RF signal [11,12]. Before the deposition process, the silicon substrates were cleaned by ion bombardment in argon plasma discharge in order to improve the adhesion of the DLC film to the substrate.…”

Section: Methodsmentioning

confidence: 99%

“…The properties of the DLC film strongly depend on the bonding configuration (relationship between sp 3 and sp 2 fraction content) of the film. Thanks to novel deposition techniques, such as radio frequency inductively coupled plasma enhanced * E-mail: wojciech.kijaszek@pwr.edu.pl chemical vapor deposition (RF ICP PECVD), it is possible to deposit the DLC films with specific sp 3 fraction content [11,12].…”

Section: Introductionmentioning

confidence: 99%

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Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films

Kijaszek

Oleszkiewicz

Znamirowski

2017

Materials Science-Poland

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The authors have deposited the diamond-like carbon (DLC) films by radio frequency inductively coupled plasma enhanced chemical vapor deposition (RF ICP PECVD) method. The investigated DLC films with different sp3 fraction content were deposited on polished and textured silicon substrates. The sp3 fraction content of the deposited DLC films was ranging from 35 % to 70 % and was estimated from acquired Raman scattering spectra (excitation wavelength: 325 nm and 514.5 nm). The measurements of field emission characteristics were carried out in diode configuration. Emission properties of the DLC films were calculated from Fowler-Nordheim plots. The calculated electric field enhancement factor β was ranging from 56 to 198 for the DLC films deposited on polished substrates and from 115 to 445 for films deposited on textured substrates. The surface of the DLC films was observed by scanning electron microscope (SEM) after field emission measurements. The acquired SEM images reveled that the activation of field emission from the DLC films is connected with generation of structural damage to the DLC films.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films

Kijaszek

Oleszkiewicz

Znamirowski

2017

Materials Science-Poland

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“…Одним из надежных методов получения однородных и морфологически гладких DLC-покрытий является метод PECVD (plasma-enhanced chemical vapor deposition) [11,12]. Его улучшенный вариантосаждение в плазме индуктивно-связанного разряда (ICPCVD, inductively coupled plasma chemical vapor deposition) [13][14][15]. В ICPCVD благодаря плотной плазме (∼ 10 13 реакционных частиц в 1 см 3 ) удается поддерживать высокую скорость процесса при пониженных температурах без увеличения емкостной мощности.…”

Section: Introductionunclassified

Плазмохимическое Осаждение Алмазоподобных Пленок На Поверхности Монокристаллического Высоколегированного Алмаза

Охапкин¹,

Юнин²,

Дроздов³

et al. 2019

Физика И Техника Полупроводников

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The plasma-chemical deposition of diamond-like carbon (DLC) films onto heavily boron-doped single-crystal p -type diamond (the concentration ~10^20 cm^–3) in CH_4 + Ar plasma is conducted. The deposition rate is 7 nm min^–1. The elemental composition and properties of the films are studied in detail. It is found that the films are enriched with hydrogen, possess a density of 2.4 g cm^–3, and exhibit an ultrasmooth surface (with a roughness of 0.4 ± 0.2 nm).

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Multilayer Diamond‐Like Carbon Films on Monocrystalline Diamond

Okhapkin,

Drozdov,

Yunin

et al. 2024

Physica Status Solidi (a)

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Multilayer films of diamond‐like carbon (DLC) on monocrystalline diamond substrates have been for the first time obtained by plasma‐chemical deposition. Their chemical composition and structural and morphological properties are studied. The DLC individual layers differ in their sp3 carbon content. The multilayer nature of the resulting coatings is confirmed by periodic density modulation on the small‐angle X‐ray reflectometry curve and modulations in the CsC8, CsC6, CsC4 lines on the crater depth profile of secondary ions of elements (secondary ion mass spectrometry). The dependence of the deposition rate of multilayer DLC films on diamond, their composition and properties on the argon additive to the reaction gas mixture, as well as on methane flow, pressure and growth time, are studied.

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Characterization of Diamond-like Carbon (DLC) films deposited by RF ICP PECVD method

Cited by 5 publications

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Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films

Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films

Плазмохимическое Осаждение Алмазоподобных Пленок На Поверхности Монокристаллического Высоколегированного Алмаза

Multilayer Diamond‐Like Carbon Films on Monocrystalline Diamond

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