Characterization of Deposited and Nitrogen-implanted Titanium Films

Abstract

Deposited Ti films and TiN films formed by nitrogen-implantation were investigated by transmission electron microscope (TEM) observation and electron energy loss spectroscopy (EELS). Titanium films in the thickness of 100 nm were deposited by an electron beam heating method onto thermally cleaned NaCl(001) surfaces held at room temperature under ultra-high vacuum. In the deposited Ti films, there coexist mainly (03 · 5)-oriented hcp-Ti and (110)

Effect of pulse shape and energy on the surface roughness and mass transfer in the electrospark coating process

“…Thus, the control of these parameters has great importance for the ESD process. Improved ESD equipment with a transistorized pulse generator makes it possible to change the frequency and electrical parameters of spark discharge (discharge pulse) and it can provide different pulse forms [12,13]. The system included a special oscilloscope (Tektronix TDS 220) to determine the energy of pulses.…”

“…In modern ESD equipments, solid-state devices are used to produce more accuracy control over the ESD characteristics like spark energy (amplitude and duration time) and spark frequency [12,13]. So a thicker deposition layer and less rough surface can be achieved.…”

Synthesis of Fe based ZrB2 composite coating by gas tungsten arc welding

“…However, the heat input of GTAW is relatively low. Meanwhile, the wettability of B 4 C ceramics and iron substrate is relatively poor 11. Therefore, it is hard to obtain good surface forming of S1 precursor powder compared with S2 precursor powder.…”