Characterization of Cu₂O thin films prepared by evaporation of CuO powder

Nanostructured copper oxide semiconductors: a perspective on materials, synthesis methods and applications

“…Deposition of Cu x O lms using thermal evaporation is achieved by vaporizing a source material of Cu or Cu x O (in either powder or condensed form) using heat either in a vacuum or in a controlled gaseous environment at a low pressure. 25,45,[130][131][132][133] The vaporized Cu or Cu x O that emanates from the material source interacts with the gas molecules in the environment of the deposition chamber before condensing onto a substrate. Processing parameters such as evaporation temperature, substrate temperature, substrate type, gas environment and pressure all play important roles in achieving the desirable Cu x O thin lms.…”

“…25,131,134 It has been reported that the as-synthesized Cu x O lms from these methods are usually compact thin lms, which are textured by nanocrystallites (25-30 nm). 25,45,132,133 3.1.1.3 Thermal oxidation. Thermal oxidation techniques offer a simple, convenient and fast method to synthesize nanostructured Cu x O with various morphologies including nanowires, nanoribbons and nanorods.…”

Chromatic Change in Copper Oxide Layers Irradiated with Low Energy Ions

“…It is well known that the color of cuprous oxide (Cu 2 O) powder is red. In addition, Cu 2 O in the form of both the thin film [35,36] and nanoparticle [37,38] would be reddish considering their optical absorption spectra. On the other hand, the color of the irradiated layer was found to be dark blue-purple, different from the color of pure Cu 2 O. Fredj and Burleigh [39] showed that the color of a copper oxide layer in which Cu 2 O is primarily included varied from bare copper color to green depending on its thickness.…”

Effects of Oxygen Flow Rates on the Physical Characteristics of Magnetron Sputtered Single-Phase Polycrystalline Cu2O Films

“…At present, the technologies for preparing semiconductor thin films include vacuum evaporation 13 , chemical vapor deposition 14 , electrochemical sedimentation 15 , sol-gel 16 , electron beam evaporation 17 , solution growth 18 , molecular beam epitaxy 19 and magnetron sputtering. Among them, RF magnetron sputtering has become one of the optimal methods to deposit Cu 2 O films due to its advantages of high deposition rate and strong controllability of the chemical composition and deposition of uniform films on large area substrates 20,21 .…”