2007
DOI: 10.1117/1.2437212
|View full text |Cite
|
Sign up to set email alerts
|

Characterization of collector optic material samples exposed to a discharge-produced plasma extreme ultraviolet light source

Abstract: Extreme ultraviolet ͑EUV͒ light sources with efficient emission at 13.5 nm are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. These experiments expose optics to a large flux of energetic particles coming from the expansion of the pulsed-plasma EUV source to investigate mirror damage due to erosion, layer mixing, and ion implantation. The debris ion spectra are analyzed using a spherical sector energy analyzer ͑ESA͒ showi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
4
0

Year Published

2008
2008
2014
2014

Publication Types

Select...
4
2

Relationship

1
5

Authors

Journals

citations
Cited by 6 publications
(4 citation statements)
references
References 12 publications
0
4
0
Order By: Relevance
“…This paper reports a part of the Collector Lifetime and Erosion Project at the University of Illinois at Urbana-Champaign (UIUC) [1][2][3] , sponsored by SEMATECH and operated in cooperation with Intel Corporation and Xtreme Technologies GmbH. The purpose of this project is to examine the effects of ion debris interaction with the primary collector optic in commercial EUV sources to ascertain the fundamental erosion processes and critical lifetime issues facing high-volume manufacturing (HVM) for EUV lithography.…”
Section: Introductionmentioning
confidence: 98%
“…This paper reports a part of the Collector Lifetime and Erosion Project at the University of Illinois at Urbana-Champaign (UIUC) [1][2][3] , sponsored by SEMATECH and operated in cooperation with Intel Corporation and Xtreme Technologies GmbH. The purpose of this project is to examine the effects of ion debris interaction with the primary collector optic in commercial EUV sources to ascertain the fundamental erosion processes and critical lifetime issues facing high-volume manufacturing (HVM) for EUV lithography.…”
Section: Introductionmentioning
confidence: 98%
“…Some examples are the characterization and processing of materials [3][4][5][6]; techniques for high-resolution metrology [7][8][9][10][11]; studies in atomic physics, photochemistry, and photophysics [12,13]; biological imaging [14][15][16][17]; the diagnosis of very high-density plasmas [18][19][20][21]; the study of nonlinear phenomena [22,23]; and even integrated circuit lithography [24].…”
Section: Introductionmentioning
confidence: 99%
“…An innovative idea using the Gibbsian segregation (GS) concept as the potential grazing incident EUV collector optics is developed and explored [10][11][12][13]. GS processes have been defined [14,15] as the tendency of certain solute elements in a homogenously interspersed solid solution to accumulate at imperfections, such as grain boundaries and interfaces in the bulk lattice that then may segregate to the free sur-faces.…”
Section: Introductionmentioning
confidence: 99%
“…If the regenerative transport processes (bulk, grain, interface diffusion) and surface renormalization are faster than the erosion time scale (i.e., the average time between large energy sputtering events), then the collector optics would be self-repairing. Early works have been published to assess the suitability of the GS alloy technology for early adoption of EUV lithography and test the validity with the theoretical estimate [10][11][12][13]. This work describes further experimental efforts to discover if GS alloys effectively ameliorate and self-heal the damage in grazing incidence EUV collector optics.…”
Section: Introductionmentioning
confidence: 99%