Characterization of cobalt thin films electrodeposited onto silicon with two different resistivities

Influence of saccharin on morphology and properties of cobalt thin films electrodeposited over n-Si(100)

“…The surface is not completely covered by the metal nuclei, which are an average size of 240 nm in diameter. Accordingly with the chronogalvanometric observations, as the potential increases and consequently the driving force increases, the nucleus size decreases [17,20].…”

“…A previous study showed that the level of doping of the semiconductor plays a role in cobalt film nucleation [17]. Because low-resistivity silicon (LRS) has a higher doping level than high-resistivity silicon (HRS), films deposited onto LRS substrate present higher density of nuclei, smaller-sized and more homogeneously distributed over the surface than those obtained over HRS substrate, at the same cathodic potential deposition.…”

Morphology, structure, and magnetism of FeCo thin films electrodeposited on hydrogen-terminated Si(111) surfaces

“…Munford et al [13] have demonstrated the feasibility of electrodeposition of high-quality continuous Co films on n-type Si(100), and different groups have already reported their electrochemical conditions for the deposition of these metal films on silicon substrates [14][15][16][17]. Even nanosized Co structures on n-and p-type Si(111) [18][19][20] were obtained without evidence of oxide formation, interdiffusion, or solid-state reactivity.…”

Electrolytic magnesium recovery from drinking water membrane residuals

“…3). This differs somewhat from the flake-like morphology observed by Dinamani and Kamath [22] for the galvanostatic production of brucite on stainless steel, perhaps reflecting a dependence in the deposition mechanism as a function of deposition mode as reported in the literature for metal deposition [24,25]. At the working electrode, it is reported that hydroxide is produced in nitrate solutions via the reduction of both water and nitrate as follows [22]:…”

“…This difference may reflect that the mode of deposition under galvanostatic conditions differed from that under potentiostatic conditions. Under galvanostatic conditions deposition is reported to be due to the process of progressive nucleation [24,25], wherein the precipitate nuclei grow on pre-existing nuclei under a fixed rate of deposition and presumably present a flaky aspect. Cell current is a very important process parameter and under galvanostatic conditions it is expected that over a given time period that charge circulation, OH -ion generation and thus Mg(OH) 2 precipitation will increase with increasing cell current.…”