Characterization of arsenphosphosilicate glass films for VLSI applications—Part I. Composition and physicochemical properties

Light trapping of crystalline Si solar cells by use of nanocrystalline Si layer plus pyramidal texture

“…For the pyramidal structure with the SSCT method, on the other hand, the reflectivity is low even in the long wavelength region (≥950 nm), indicating sufficient absorption of incident light.When a PSG layer was deposited on the Si surfaces treated with the SSCT method for 20 s followed by the heat treatment at 925 °C (curve c), the reflectivity was nearly unchanged (≤3 %) from that before PSG deposition (curve b). The refractive index of PSG is reported to be 1.4~1.5[17], which is nearly the same as that of the nanocrystalline Si surface produced by the SSCT treatment for 20 s.Therefore, deposition of PSG on the nanocrystalline Si layer does not change the refractive index, leading to the unchanged reflectivity of less than 3 %.…”