2022
DOI: 10.3389/fphy.2022.968101
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Characterization of amorphous carbon films from 5 nm to 200 nm on single-side polished a-plane sapphire substrates by spectroscopic ellipsometry

Abstract: In this work, a series of amorphous carbon films were deposited on a-plane sapphire substrates by magnetron sputtering with deposition time from 15 min to 8 h, in order to investigate the thickness and optical properties in the process of growth in a non-destructive way. They were characterized by using Mueller matrix spectroscopic ellipsometry together with topography profilometry and Raman spectroscopy. Two models of a Bruggeman effective medium approximation model and a single Cody-Lorentz oscillator model … Show more

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Cited by 3 publications
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“…Thin Carbon films are generally deposited using the Chemical Vapor Deposition (CVD) method with hydrocarbon compounds as the precursors, such as ethanol [3], methane gas [4][5][6][7][8], di-iso-propyl-ether ((i-C 3 H 7 ) 2 O) [9], acetylene [10]. The percentage of sp 3 , sp 2 and sp hybridization is strongly influenced by the carbon source.…”
Section: Introductionmentioning
confidence: 99%
“…Thin Carbon films are generally deposited using the Chemical Vapor Deposition (CVD) method with hydrocarbon compounds as the precursors, such as ethanol [3], methane gas [4][5][6][7][8], di-iso-propyl-ether ((i-C 3 H 7 ) 2 O) [9], acetylene [10]. The percentage of sp 3 , sp 2 and sp hybridization is strongly influenced by the carbon source.…”
Section: Introductionmentioning
confidence: 99%