The potential difference between a floating emitting surface and the plasma surrounding it has been described by several sheath models, including the space-charge-limited sheath, the electron sheath with high emission current, and the inverse sheath produced by charge-exchange ion trapping. Our measurements reveal that each of these models has its own regime of validity. We determine the potential of an emissive filament relative to the plasma potential, emphasizing variations in emitted current density and neutral particle density. The potential of a filament in a diffuse plasma is first shown to vanish, consistent with the electron sheath model and increasing electron emission. In a denser plasma with ample neutral pressure, the floating filament potential is positive, as predicted by a derived ion trapping condition. Lastly, the filament floated negatively in a third plasma, where flowing ions and electrons and nonnegligible electric fields may have disrupted ion trapping. Depending on the regime chosen, emitting surfaces can float positively or negatively with respect to the plasma potential.Any solid surface in contact with a plasma is surrounded by the sheath, a potential structure that controls particle and energy transport between the plasma and the surface [1]. Sheath structure is complicated when the surface emits an electron current, which can be caused by impinging radiation or plasma particles. Emissive sheaths are present in divertors [2] and scrape-off layers [3] in magnetic fusion devices, around dust grains in laboratory [4] and astrophysical [5] plasmas, around satellites [6], in RF plasma processing devices [7] and around plasma probes [8]. In all of these cases, the interplay between emitted and background plasmas determines the structure of sheath that forms. Predicting which structure exists is essential for understanding the heat and charge flux to the surface.A surface emits a normalized currentĴ = J emit /J e in a background electron current J e . WhenĴ = 0, mobile plasma electrons charge the surface negatively so that its potential is negative with respect to the plasma potential φ P (in this work, all surface potentials called positive r/r 0 −3 −2 −1 0 ∆φ [V] T e [eV] (a)