Characterization of a capacitively coupled RF plasma for SiO2 deposition: numerical and experimental results

Goujon, M.; Belmonte, T.; Henrion, G.

doi:10.1016/j.tsf.2004.07.027

Cited by 4 publications

(2 citation statements)

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“…Investigations into achieving better adhesion of nanoparticles have been undertaken on various plasma systems and with various gases used in the system. [35][36][37][38][39][40] This paper addresses the phenomena related to the surface modification of cotton in a CF 4 plasma reactor where a high-purity atmosphere cannot be achieved due to desorption of water vapor from the samples and limitations on the pumping speed. Most authors were using either pure oxygen plasma (or plasma created in a mixture of oxygen and a noble gas), or pure C x F y plasma.…”

Section: Introductionmentioning

confidence: 99%

CF4 plasma and silver functionalized cotton

Gorjanc

Bukošek

Gorenšek

et al. 2010

Textile Research Journal

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In an attempt to use minimal concentrations, initially, of silver nanoparticles for loading onto textiles and to achieve maximum concentrations on the material, CF4 low-pressure plasma was used on bleached and mercerized cotton fabric. The concentrations of silver on the fabrics were determined by the ICP-MS method (inductively coupled plasma-mass spectrometry), the morphology of fiber surfaces was observed with a scanning electron microscope (SEM), and an x-ray photoelectron spectroscopy (XPS) study was used for the evaluation of surface chemical changes. The antibacterial effect of silver loaded fabrics was tested against Enterococcus faecalis and Pseudomonas aeruginosa. The best results were found for plasma-treated cotton fabric functionalized with 30 nm silver particles. The results show effective plasma etching of the fabric surface, which caused excellent adhesion of silver particles. Color measurements of dyed samples showed that CF 4 plasma does not affect the color of dyed cotton. The mechanical properties of cotton remain unaltered after plasma treatment.

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Section: Introductionmentioning

confidence: 99%

CF4 plasma and silver functionalized cotton

Gorjanc

Bukošek

Gorenšek

et al. 2010

Textile Research Journal

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“…There, ionizations produce slow electrons instead, and the beam energy is progressively lost to inelastic collisions (both ionizations and excitations) until it lies below the lowest excitation threshold, in which case the beam electrons become part of the (slow) plasma electrons. The particle and energy balance equations for the beam (fast) electrons are written as in [63]:…”

Section: Model Descriptionmentioning

confidence: 99%

N₂–H₂ capacitively coupled radio-frequency discharges at low pressure: II. Modeling results: the relevance of plasma-surface interaction

Jiménez-Redondo¹,

Chatain²,

Guaitella³

et al. 2020

Plasma Sources Sci. Technol.

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In this work, we present the results of simulations carried out for N2-H2 capacitively coupled radio-frequency discharges, running at low pressure (0.3-0.9 mbar), low power (5-20 W), and for amounts of H2 up to 5%. Simulations are performed using a hybrid code that couples a two-dimensional time-dependent fluid module, describing the dynamics of the charged particles in the discharge, to a zero-dimensional kinetic module, that solves the Boltzmann equation and describes the production and destruction of neutral species. The model accounts for the production of several vibrationally and electronic excited states, and contains a detailed surface chemistry that includes recombination processes and the production of NHx molecules. The results obtained highlight the relevance of the interactions between plasma and surface, given the role of the secondary electron emission in the electrical parameters of the discharge and the critical importance of the surface production of ammonia to the neutral and ionic chemistry of the discharge.

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OLED substrate conditioning by low power density RF plasmas

Svarnas

Bradley

Shard

2009

Surface and Coatings Technology

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Characterization of a capacitively coupled RF plasma for SiO2 deposition: numerical and experimental results

Cited by 4 publications

References 10 publications

CF4 plasma and silver functionalized cotton

CF4 plasma and silver functionalized cotton

N₂–H₂ capacitively coupled radio-frequency discharges at low pressure: II. Modeling results: the relevance of plasma-surface interaction

OLED substrate conditioning by low power density RF plasmas

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Characterization of a capacitively coupled RF plasma for SiO2 deposition: numerical and experimental results

Cited by 4 publications

References 10 publications

CF4 plasma and silver functionalized cotton

CF4 plasma and silver functionalized cotton

N2–H2 capacitively coupled radio-frequency discharges at low pressure: II. Modeling results: the relevance of plasma-surface interaction

OLED substrate conditioning by low power density RF plasmas

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Product

Resources

About

N₂–H₂ capacitively coupled radio-frequency discharges at low pressure: II. Modeling results: the relevance of plasma-surface interaction