Characterization and properties of amorphous carbon coatings prepared by middle frequency pulsed unbalanced magnetron sputtering at different substrate bias

Dai, Huanyun; Wang, Y.Q.; Cheng, Xue Rui; Zhan, Changyong; Huang, Nan

doi:10.1016/j.apsusc.2012.02.039

Cited by 13 publications

(7 citation statements)

References 17 publications

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“…Roughness factors are 1.86 for Pt-C film and only 1.54 for Pt (close to the roughness factor for Pt foil, which equals 1.2-1.5). This is in a good agreement with data [29][30][31] that show that negative bias voltage application increases film density and improves hardness and adhesion. Catalytic activity of these films is low because their surface is not well developed (the roughness factor is low).…”

Section: Discussionsupporting

confidence: 92%

“…The structure and catalytic activity of the Pt and Pt-C films deposited by DC sputtering with negative bias voltage have minimal differences compared to those of films deposited using all other sputtering regimes. As was shown in [29] strong re-sputtering of deposited carbon atoms occurred at such a bias voltage. This explains the absence of microstructure dependence on target composition (in contrast to the case of DC sputtering without negative bias voltage).…”

Section: Discussionsupporting

confidence: 59%

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Structural and Electrocatalytic Properties of Platinum and Platinum-Carbon Layers Obtained by Magnetron-Ion Sputtering

et al. 2018

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This article is devoted to further development of magnetron sputtering technology for catalysts and catalysts layer production for fuel cells and other electrochemical devices. Platinum-carbon films with Pt content up to 95–97 wt % were deposited using different sputtering regimes—DC (direct current) sputtering with and without application of a pulse negative bias voltage to the titanium substrate and also bipolar pulse sputtering with frequency of 10 kHz and 100 kHz. Composite platinum carbon targets were used for sputtering. Characteristics of platinum-carbon films were compared with those of platinum films deposited using the same regimes. The main methods of investigation were scanning transmission electron microscopy (STEM) with energy dispersive X-ray spectroscopy; potentiostatic and potentiodynamic methods. The catalytic activity of platinum-carbon films increased with platinum content and at a platinum concentration of 95–97 wt % became higher than that of platinum films sputtered in the same regimes. It was proposed that carbon atoms deposited on the substrate limited the mobility of the deposited platinum species and inhibited Pt cluster growth. Platinum-carbon films produced by pulsed DC magnetron sputtering with pulsed frequency 100 kHz consisted of narrow Pt columns with dome nanotops forming a well-developed surface. The porosity and specific surface of these columnar nanopillar films were higher compared with those of pure platinum films deposited under the same conditions. Moreover, the platinum-carbon films deposited using a bipolar pulse regime with a frequency of 100 kHz had the highest specific surface, porosity (30%) and catalytic activity in hydrogen and oxygen evolution due to a high ion current density and reduced pulse duration which inhibited the growth of large platinum globules.

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Section: Discussionsupporting

confidence: 92%

Section: Discussionsupporting

confidence: 59%

Structural and Electrocatalytic Properties of Platinum and Platinum-Carbon Layers Obtained by Magnetron-Ion Sputtering

et al. 2018

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“…The deconvolution of this peak allows quantifying the relative sp 2 and sp 3 bindings amount due to a slight difference in binding energy levels. [11,20,21]. Insuring a very low energy levels shift (less than 1%) between all our samples, we quantify sp 2 and sp 3 contribution values with a very good precision ( ± 0.5%).…”

Section: Characterization Techniquesmentioning

confidence: 83%

UV laser annealing of Diamond-Like Carbon layers obtained by Pulsed Laser Deposition for optical and photovoltaic applications

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Antoni

Diebold

et al. 2019

Applied Surface Science

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“…Under this deposition condition, the ion implantation is associated with a compressive stress and densification, which in turn leads to the increased fraction of the sp 3 C bond. In the condition of substrate bias, the energy of carbon ions that reach the substrate increases with the increase of substrate bias, and it has been found that the sp 3 content, hardness, and compressive stress in DLC films deposited by pulsed unbalanced magnetron sputtering increases with increasing substrate bias from 0 to 120 V . In the DLC films deposited with step biasing, a step increase of bias helps to reduce the residual stress due to the gradual variation of the sp 3 /sp 2 ratio, hardness and compressive stress, the soft and low‐stress DLC layer being susceptible to plastic deformation could act as a supporting layer to relieve the residual stress of the hard and high‐stress DLC layers .…”

Section: Resultsmentioning

confidence: 99%

Effect of step biasing on diamond-like carbon films deposited by pulsed unbalanced magnetron sputtering

Hirata

Chen

Xue

et al. 2013

Phys. Status Solidi A

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Diamond‐like carbon (DLC) films were deposited on Si substrates by pulsed unbalanced magnetron sputtering with different bias configurations: constant bias and step biasing. The structure, surface morphology, and mechanical properties of the DLC films were investigated by Raman spectroscopy, X‐ray photoelectron spectroscopy, atomic force microscopy (AFM) and nanoindentation etc. It has been found that the sp3 content in the DLC films deposited with step biasing is less than that deposited under constant bias. AFM measurements show that the root‐mean‐square (RMS) surface roughness of the films deposited with step biasing is less than that deposited under constant bias; and the smaller step increase of bias, the lower the RMS roughness. Nanoindentation and residual stress tests indicate that step biasing with 20 min of time intervals and with 20 V of bias reduces the stress of DLC films from 5.8 to 3.5 GPa with little sacrifice of hardness from 13.3 to 12.5 GPa. The results above are useful for the practical application of DLC films.

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Characterization and properties of amorphous carbon coatings prepared by middle frequency pulsed unbalanced magnetron sputtering at different substrate bias

Cited by 13 publications

References 17 publications

Structural and Electrocatalytic Properties of Platinum and Platinum-Carbon Layers Obtained by Magnetron-Ion Sputtering

Structural and Electrocatalytic Properties of Platinum and Platinum-Carbon Layers Obtained by Magnetron-Ion Sputtering

UV laser annealing of Diamond-Like Carbon layers obtained by Pulsed Laser Deposition for optical and photovoltaic applications

Effect of step biasing on diamond-like carbon films deposited by pulsed unbalanced magnetron sputtering

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