Abstract:Al0.22Ga0.78As/In0.18Ga0.82As/Al0.22Ga0.78As double heterojunction high electron mobility transistors (DH-HEMTs) with gate structures of traditional planar gate (PG), one-stage gamma-gate (1SΓG) and two-stage gamma-gate (2SΓG) formed by using the Al0.22Ga0.78As/In0.49Ga0.51P etch-stop layers (ESL) are simulated and presented in this work. Based on this proposed ESL structure design, the fabrication and implementation of studied DH-HEMT device with 1SΓG and 2SΓG could be expected. Both ΓG-structure devices show… Show more
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