Characteristics of titanium arc evaporation processes

Martin, Philip; McKenzie, David R.; Netterfield, R. P.; Swift, P.; Filipczuk, S.W.; Müller, K.‐H.; Pacey, C. G.; James, B. W.

doi:10.1016/0040-6090(87)90173-8

Cited by 113 publications

(16 citation statements)

References 15 publications

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“…17 The ionatom collection leads to a charge exchange process of the type: Cr (n)ϩ ϩAr→Cr (nϪ1)ϩ ϩAr ϩ whereby the mean charge state can alter. [18][19][20] The Q values for this reaction are 0.73 and Ϫ8.95 eV for nϭ2 and 1, respectively. While the case nϭ2 is energetically favorable, for nϭ1 the threshold energy of 20.6 eV as calculated using the method given in Ref.…”

Section: A Substrate Etching Rate and Plasma Diagnostic Measurementsmentioning

confidence: 99%

Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics

Schönjahn

Ehiasarian

Lewis

et al. 2001

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Emission spectra analysis of arc plasma for synthesis of carbon nanostructures in various magnetic conditionsCr ions generated by a steered cathodic arc discharge are utilized to control and enhance the adhesion properties of 3.5 m thick Ti x Al (1Ϫx) N based coatings deposited on high speed steel substrates. A two-step etching procedure ͑negative substrate bias, U S ϭ1200 V͒ is suggested, operating the arc discharge initially in an Ar atmosphere (p Ar ϭ0.09 Pa, 6.75ϫ10 Ϫ4 Torr͒ to achieve predominantly metal removing effects ͑etching rate: 9 nm min Ϫ1 ) with a mixture of Ar and Cr ions. In the second stage at residual gas pressure level (p Ar р0.006 Pa, 4.5ϫ10 Ϫ5 Torr, etching rate: 4 nm min Ϫ1 ) pure Cr ion irradiation leads to a Cr penetration as deep as 20 nm with a Cr accumulation of approximately 37 at % at the interface substrate/coating. This procedure promotes localized epitaxial growth of Ti x Al (1Ϫx) N and enhances critical load values up to 85Ϯ5 N.

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Section: A Substrate Etching Rate and Plasma Diagnostic Measurementsmentioning

confidence: 99%

Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics

Schönjahn

Ehiasarian

Lewis

et al. 2001

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…The intensity of several characteristic spectral lines corresponding to Ti and N particles with different charge states as a function of p was studied, concluding that the main atomic reaction responsible for the generation of molecular ions was charge-exchange between metallic ions and N 2 molecules. By employing a Fabry-Perot interferometer in conjunction with a monochromator and an electrostatic analyzer, Martin et al 5 studied photon and ion emission from a Ti cathode arc operated with either N 2 or O 2 gases in a pressure range of 10 Ϫ4 -1 Pa. Their observations on the N 2 spectral lines behavior with p were similar to those presented in Ref. 4, so charge-exchange reactions between metallic ions and gas molecules were again claimed as the main channel for the production of molecular gas ions.…”

Section: Introductionmentioning

confidence: 99%

Role of metallic neutrals and gaseous molecular ions in a copper cathodic arc operated with oxygen gas

Lepone

Kelly

Márquez

2001

Journal of Applied Physics

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The plasma-neutral gas structure generated in a copper cathodic arc operated with oxygen gas at a constant current level of 100 A has been investigated by employing a Langmuir spherical probe and a calorimetric technique. The plasma potential and electron temperature at several axial distances (between 10 and 25 cm) from the cathode surface and for different O2 pressure values (between 0.5 and 5 Pa) have been measured. A simplified one-dimensional model which incorporates the relevant atomic processes of the problem (charge-exchange, lateral diffusion loses, electron impact ionization, and dissociative recombination) is developed. This model allows calculating densities and drift velocities of the different species and, in particular, predicts the creation of a considerable number of metallic neutrals and gaseous ions. A comparison of the experimental ion saturation probe current and the heat source term derived from the calorimetric measurements with the corresponding quantities predicted by the model is performed. We found good agreement between theory and experiment, notwithstanding the fact that the physical quantities presented large variations, and the atomic reaction rates varied for several orders of magnitude, over the range of gas pressure and axial position values investigated.

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“…Computer simulations [13,14] of coating deposition without and with ions have shown that a dense coating microstructure can result directly from the ion flux bombardment on the substrate. The coatings exhibit minimal defects and maximum contact with the substrate.…”

Section: Resultsmentioning

confidence: 99%

Metallic coatings of high adhesion on plastics via low-temperature arc vapor deposition (LTAVD)

Narendrnath

Zhao

1992

Journal of Adhesion Science and Technology

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Characteristics of titanium arc evaporation processes

Cited by 113 publications

References 15 publications

Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics

Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics

Role of metallic neutrals and gaseous molecular ions in a copper cathodic arc operated with oxygen gas

Metallic coatings of high adhesion on plastics via low-temperature arc vapor deposition (LTAVD)

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