Characteristics of TiO<sub>2</sub>Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas

Kawakami, Retsuo; Niibe, Masahito; Takeichi, Atsushi; Mori, Yukari; Konishi, Masashi; Kotaka, Takuya; Matsunaga, Fumihiko; Takasaki, Toshihide; Kitano, Takanori; Miyazaki, Tsuyoshi; Inaoka, Takeshi; Tominaga, Kikuo

doi:10.7567/jjap.51.08hb04

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“…等离子处理方法不仅能有效进行元素掺杂, 而且在处理过程中高能电子和基团与材料的表面碰撞、溅射所形成的氧空位和Ti 3+ 缺陷, 也能显著提高TiO 2 的光催化性能 [16][17][18] . 在多种等离子放电方式中, 介质阻挡放电 (DBD)作为一种低温等离子放电方式, 相对于其他放电方式无需复杂的设备, 操作更简单, 反应条件要求更低, 耗能低, 更具有可操作性 [19,20] .…”

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Effect of N2/Ar plasma treatment on the visible light photocatalytic activity of CuO/TiO2

Luo¹,

Jiang²,

Hu³

et al. 2014

Chinese Journal of Catalysis

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“…Dielectric barrier discharge (DBD) is a kind of low temperature discharge plasmas. As compared with other kinds of discharges, the DBD apparatus is more compact in structure, more convenient to operate, and has a lower requirement of the reaction and low energy consumption [19,20].…”

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confidence: 99%

Effect of N2/Ar plasma treatment on the visible light photocatalytic activity of CuO/TiO2

Luo¹,

Jiang²,

Hu³

et al. 2014

Chinese Journal of Catalysis

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Recovery of x-ray absorption spectral profile in etched TiO2 thin films

Sano

Niibe

Kawakami

et al. 2015

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Near edge x-ray absorption fine structure (NEXAFS) spectra of plasma-etched TiO2 thin films were observed using the total fluorescence yield method involving visible emission. The disrupted spectrum recovered its as-grown (nonetched) profile, upon soft x-ray (SX) irradiation. This recovery was investigated by ultraviolet (UV) irradiation, spatial distribution measurements, exposing recovered samples to air, and NEXAFS measurements of ultrafine TiO2 particles. The spectral profile recovered upon UV irradiation, and at sample positions outside of the SX irradiation site. The recovered spectral profiles were disrupted again, upon exposure to air. Nonetched ultrafine TiO2 particles also exhibited a disrupted spectral profile, which was recovered upon SX irradiation. The spectral recovery is explained by a model involving electrons trapped in oxygen vacancies generated by etching.

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Characteristics of TiO₂Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas

Cited by 2 publications

References 29 publications

Effect of N2/Ar plasma treatment on the visible light photocatalytic activity of CuO/TiO2

Effect of N2/Ar plasma treatment on the visible light photocatalytic activity of CuO/TiO2

Recovery of x-ray absorption spectral profile in etched TiO2 thin films

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Characteristics of TiO2Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas

Cited by 2 publications

References 29 publications

Effect of N2/Ar plasma treatment on the visible light photocatalytic activity of CuO/TiO2

Effect of N2/Ar plasma treatment on the visible light photocatalytic activity of CuO/TiO2

Recovery of x-ray absorption spectral profile in etched TiO2 thin films

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Product

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Characteristics of TiO₂Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas