Characteristics of plasma parameters in sputtering deposition using a powder target

Nishikawa

et al. 2020

Jpn. J. Appl. Phys.

Nickel-doped stainless steel thin films with high hydrogen-entry resistance were prepared on a metal and Si surface via sputter deposition. For this, mixed nickel oxide (NiO) and stainless steel (SUS304) powders were used as the sputtering target. The experimental results indicated that nickel-doped stainless steel thin films could successfully be prepared both on the stainless steel and Si substrate surface. XPS measurements demonstrated that the deposition rate was dependent on the processing conditions such as input RF power, and the thin-film Ni/SUS304 concentration ratio strongly depended on the powder target composition.

Section: Introductionmentioning

confidence: 97%

Section: Introductionmentioning

confidence: 99%

Preparation of Ni-doped stainless steel thin films on metal to prevent hydrogen entry via sputter deposition with a powder target

Nishikawa

et al. 2020

Jpn. J. Appl. Phys.

“…This method shows high reproducibility for the preparation of crystalline thin films. The versatility of the PLD method has enabled the development of various functional thin films, such as tungsten carbide, silicon carbide, chromium carbide, titanium carbide, cubic boron nitride, carbon nitride and silicon nitride [6][7][8][9][10][11][12][13][14][15].…”

Section: Introductionmentioning

confidence: 99%

Titanium Oxide Thin Film Preparation by Pulsed Laser Deposition Method Using Ti and TiO<sub>2</sub> Powder Target

Trans. Mat. Res. Soc. Japan

Yagyu

et al. 2015

Titanium oxide thin films were prepared by a pulsed laser deposition method using Ti and TiO 2 powder and bulk targets. The deposition rate when using a powder target was higher than that in the case of a bulk target. These results may be caused as follows. The heat absorptivity of a powder target for the 532 nm laser light is higher than that of a bulk target. In addition, the net-ablation area of the powder target is larger than that of the bulk target. X-ray diffraction measurements suggest that the films prepared using the Ti and TiO 2 powder target without substrate heating system are titanium oxide (TiO x : x=0~2). The diffraction patterns of the prepared films using powder targets indicated nearly the same properties as those of films prepared using Ti and TiO 2 bulk targets. The results may be due to the target surface oxidation by laser ablation on the target surface.

“…The method suitable for preparation of large-area uniform amorphous and crystalline thin films for applications such as solar cells [10][11][12], liquid panel displays, and photocatalysts [2,[4][5][6]. The method's versatility has allowed the deposition of numerous types of functional thin films such as tungsten carbide, silicon carbide, chromium carbide, titanium carbide, cubic boron nitride, carbon nitride, and silicon nitride [13][14][15][16][17][18][19][20][21][22][23][24][25][26].…”

Section: Introductionmentioning

confidence: 99%

Kinetics of TiO<sub>2</sub> thin film fabrication by sputtering deposition using metal based powder target

Trans. Mat. Res. Soc. Japan

Yagyu

et al. 2015

Titanium-based functional thin films were prepared by a sputtering deposition method using a metal powder target. To determine the deposition mechanism of the resulting TiO 2 thin films, the electron density and temperature of the processing plasma were investigated. The deposition rate using powder targets was 3-5 times higher than that using bulk targets. The reasons for the increased deposition rate were considered as follows. The net surface area of a powder target is twice that of a bulk target. The gamma value for ions at slanting incidence to the target surface is higher than that for perpendicular incidence. The surface temperature of the powder target was higher than that of the bulk target. The hollow cathode effect may be implicated in the case of powder targets.