2006
DOI: 10.1016/j.jcrysgro.2005.10.087
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Characteristics of InGaAsN-GaAsSb type-II “W” quantum wells

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Cited by 24 publications
(13 citation statements)
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“…GaAsSb/ GaAs type-II quantum well (QW) is one of the promising materials as the gain medium for 1.3 mm application because of the special band alignment [1]. To extend the emission wavelength to the 1.55 mm region, the InGaAsN alloys were used as the barrier layer for electron confinement in InGaAsN/GaAsSb QW [2]. However, the conventional growth temperature of GaAsSb alloys on GaAs substrates by MOVPE were far from InGaAsN alloys.…”
Section: Introductionmentioning
confidence: 99%
“…GaAsSb/ GaAs type-II quantum well (QW) is one of the promising materials as the gain medium for 1.3 mm application because of the special band alignment [1]. To extend the emission wavelength to the 1.55 mm region, the InGaAsN alloys were used as the barrier layer for electron confinement in InGaAsN/GaAsSb QW [2]. However, the conventional growth temperature of GaAsSb alloys on GaAs substrates by MOVPE were far from InGaAsN alloys.…”
Section: Introductionmentioning
confidence: 99%
“…A design study of a dilute-nitride In(Ga)AsN/GaAs 1Ày Sb y type-II ''W'' QW structure on an InP substrate for emission in the 2-5 mm range was proposed [7]. However, the MOVPEbased growth of these materials remains quite challenging because of the observed reduction in N incorporation into InGaAs(N) alloys at high indium compositions [8][9][10]. Recently, InP-based GaAs 1ÀyÀz Sb y N z /GaAs 1Ày Sb y type-II QW structures have been investigated for light emission over the 2-3 mm wavelength region through the MOVPE growth technique [11].…”
Section: Introductionmentioning
confidence: 99%
“…High-performance InGaAsNactive diode lasers that emit wavelengths at 1.3-1.32 mm have been fabricated using the MOCVD techniques [1][2][3]. However, laser emission in MOCVD-grown samples at 41.4 mm remains challenging in this alloy system because of the diminished N incorporation in alloys with high In concentrations [4]. Furthermore, increased N incorporation, when successful, generally is accompanied by degradations of device performance [5,6], possibly due to the formation of In-N clusters, fluctuations in the well width, and/or local strains induced by the presence of N [7].…”
Section: Introductionmentioning
confidence: 99%