Characteristics of a Strong Ion Source

Abstract

Construction and operating characteristics of an ion source of the capillary arc type are described. The source yields 0.4 milliampere of singly charged argon ions through an orifice 1 mm in diameter, which allows, with pumping speeds of 14 liters per second, maintenance of a pressure of 5×10−5 mm Hg in the adjacent chamber where the ions are used. The ion beam is easily focused at ion accelerating voltages of 1000 to 6000 volts. The source has been used as part of an apparatus for study of controlled sputtering of metals bombarded by argon ions, and the accompanying secondary electron emission. The source can be used advantageously in a number of analogous researches of a fundamental character, and also has application in the field of engineering and biology.

Sputtering and Secondary Electron Emission of Metals Bombarded by Argon Ions

“…16 The focusing was satisfactory at 5 X 10-5 mm Hg pressure for ion currents up to amperes which is flowing into the bombarded target P whose potential Vep with respect to the focusing cylinder C is varied from -400 v to +400 v. of ten resistors, covered by ceresin wax and placed on an insulating support. 16 The focusing was satisfactory at 5 X 10-5 mm Hg pressure for ion currents up to amperes which is flowing into the bombarded target P whose potential Vep with respect to the focusing cylinder C is varied from -400 v to +400 v. of ten resistors, covered by ceresin wax and placed on an insulating support.…”