Characteristics of a Source for Oxide Coating Deposition by the Electron-Beam Evaporation of Dielectric Materials

Abstract

We describe our investigations of a plasma-cathode electron source designed for the deposition of oxide coatings by the electron-beam evaporation of dielectric materials. Tests carried out using oxygen as the working gas showed that the source is operable without a change in parameters for at least ten hours of continuous operation. The current–voltage characteristics of the hollow-cathode plasma source in oxygen displayed a monotonically increasing character, and the voltage dependence of the discharge current was exponential. At the same time, for argon, nitrogen, and helium, the discharge voltage remained unchanged over a current ranging from 0.1 A to 1 A. A possible reason for these differences is the formation of oxides on the electrode surfaces for operation in the oxygen, impeding the discharge operation and requiring higher voltages for the same current as the other gases. The dependencies of the electron beam current on the accelerating voltage were monotonically increasing curves for all the gases except for helium, for which the beam current remained unchanged with increasing voltage over a range from two to ten kilovolts.