Characteristics of a micro dielectric barrier discharge ignited by a cold cathode with high ion-induced secondary electron emission for plasma display panel

Uchida, Satoshi; Kajiyama, Hiroshi; Shinoda, Tsutae

doi:10.1063/1.3253723

Cited by 17 publications

(8 citation statements)

References 24 publications

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“…We selected the two He spectrum lines that are listed in Table I observing the I He:667 nm /I He:728 nm characteristic. 34,35 The two He spectrum lines were observed with an optical spectrometer through a quartz tube that was located between the power and ground electrodes (see Fig. 1).…”

Section: Resultsmentioning

confidence: 99%

“…This is explained by the effect of the high electron heating efficiency, which is defined as the ratio of the energy to be transferred to the electrons to the total electrical input energy. 34,36 The shorter pulse discharges, which are characterized by rapid discharge growth, have a higher average electron heating efficiency because in the later period of the pulse discharge, the electron heating efficiency becomes low. This is because of significant dissipation of the input power to the many ions that are concentrated in the cathode sheath, i.e., the dominant ion heating loss in the ion sheath.…”

Section: Resultsmentioning

confidence: 99%

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Effects of discharge voltage waveform on the discharge characteristics in a helium atmospheric plasma jet

Takenaka

Setsuhara

2015

Journal of Applied Physics

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We present here an analysis of the discharge characteristics of a He plasma jet operating under three different types of applied voltage waveform: (a) a μs-pulse voltage waveform with a slow voltage rise time, (b) ns-pulse, and (c) rectangular voltage waveforms with fast voltage rise time. Optical emission measurements show that the application of a voltage with a fast voltage rise time induces rapid discharge growth and, consequently, produces an abundance of energetic electrons, which in turn leads to high optical emission from the O atoms. We also estimate the optical emission efficiency of the O atom (ηo), which corresponds roughly to the production efficiency of the reactive O species. ηo increases with increasing applied voltage, and the highest value of ηo is obtained in the shortest pulse discharge, which was ignited by a ns-pulse voltage waveform with a fast voltage rise time and short pulse width.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Effects of discharge voltage waveform on the discharge characteristics in a helium atmospheric plasma jet

Takenaka

Setsuhara

2015

Journal of Applied Physics

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“…2,11,12 Furthermore, with the development of the research in the high secondary electrons emission protective layer, the application of the high Xe partial pressure is given more convenience for the application in the commercial PDPs. [13][14][15][16] By increasing the Xe partial pressure, mostly the excimer VUV radiation that has a wavelength of 173 nm is generated. 17 Most important for the production of excimer VUV emission of 173 nm are the excimer Xe excitation states Xe 2 *( 1 R u þ ) and Xe 2 *( 3 R u þ ).…”

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confidence: 99%

Impact of Xe partial pressure on the production of excimer vacuum ultraviolet emission for plasma display panels

Zhu

Zhang

Kajiyama

2012

Journal of Applied Physics

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In this work, the effect of the Xe partial pressure on the excimer vacuum ultraviolet (VUV) emission intensity of the plasma display panels is investigated, both by measuring the spectral emission directly and by two-dimensional simulations. Experimentally, we find that at the high Xe partial pressure levels, there is an supra-linear increase of excimer VUV radiation and that determines the strong increase of luminance at the high pressures and high voltage. Due to the increase of the luminance and the almost unchanged discharge current, the luminous efficacy strongly increases with the Xe partial pressure. In addition, we also investigated the dynamics of the VUV generation, by measuring the decay time of the excimer VUV light as a function of the gas pressure. It is found that the decay time decreases with the increase of gas pressure. The spatial characteristics of the excimer VUV emission are also discussed. Different from the Ne and near-infrared emission, the excimer VUV emission is generated near the surface of the electrodes and increases uniformly on both sides of the anode and cathode (i.e., the bulk plasma region). Most importantly, it is found that the VUV production occurs during the afterglow period, while it is almost zero at the moment of the discharge itself. From the simulations, it can be seen that the Xe2*(3Σu+) excimer species, which are generated from Xe*(1s5), play a dominant role in the excimer VUV emission output at the high Xe partial pressure. The two-dimensional simulations also show that the strong increase of Xe excimer excitation states in the case of high pressure is mainly the result of the high conversion efficiency of the Xe excimer states, especially in the afterglow period. Due to the high conversion efficiency of Xe excitation species to Xe excimer species by the high collision rate in the case of high pressure, there is a strong increase of excimer VUV production, especially from the cathode.

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“…However, PDPs still have problems that must be resolved, such as high manufacturing cost and high power consumption. The reduction of power consumption by doping impurities [3][4][5] or examining the replacement of materials [6] has been proposed. MgO is also used in the development of electronics technologies, for example, the tunnel barrier of tunnel magnetoresistant (TMR) devices [7] and diamond crystal substrates.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of Magnesium Oxide Thin Films with Co Islands Microparticulated by an Arc Plasma Gun

Yamamoto

Yoshioka

Kosuga

2014

Trans. Mat. Res. Soc. Japan

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In this study, Co nanoparticles were deposited on a substrate in an island pattern using an arc plasma gun (APG). An MgO thin film was then formed on this substrate by metal organic decomposition (MOD), which enables the formation of films in atmosphere, thus yielding a double-layer structure. The MgO thin film on Co nanoparticles deposited using an APG with 500 pulses of arc discharge exhibited improved crystallinity and a photoelectron emission that was at least threefold higher than that of the MgO thin film without Co nanoparticles. It was confirmed that depositing Co nanopaticles and then forming the films on them significantly improves characteristics of the MgO thin films. We successfully established a bottom-up process that requires no ion injection by dispersing Co nanoparticles within the MgO thin film during heat treatment.

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Characteristics of a micro dielectric barrier discharge ignited by a cold cathode with high ion-induced secondary electron emission for plasma display panel

Cited by 17 publications

References 24 publications

Effects of discharge voltage waveform on the discharge characteristics in a helium atmospheric plasma jet

Effects of discharge voltage waveform on the discharge characteristics in a helium atmospheric plasma jet

Impact of Xe partial pressure on the production of excimer vacuum ultraviolet emission for plasma display panels

Characteristics of Magnesium Oxide Thin Films with Co Islands Microparticulated by an Arc Plasma Gun

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