Characterisation and performance of partially filtered arc TiAlN coatings

Stress induced preferred orientation and phase transition for ternary WCxNy thin films

“…3, it can be also shown that no diffusive halo appears in the SAED patterns in addition to some clear-cut diffraction rings, implying that there is no amorphous phase such as CN x in the WC x N y films which accords well with the DOS and XPS results. The similar trend has also been widely observed in other sputtered films [46], which can be due to the enhancement of particle bombardment induced by increasing V b . This particle bombardment has been likened to a shot peening process which generates higher defect concentrations [47] with increasing shot intensity and thus leads to an increase in intrinsic stress.…”

Arc Evaporation of Ti–Al–Ta–N Coatings: The Effect of Bias Voltage and Ta on High-temperature Tribological Properties

“…Furthermore, an increase in compressive stresses with increasing bias voltage could hinder the growth of the less dense hcp phase, compared to the denser fcc phase [16]. Such an increase in residual compressive stress with increasing bias voltage has been reported by various authors [11,17,18]. A correlation between residual stresses and the presence of hcp phase has also been published by Zhou et al [19].…”

CrN/NbN coatings deposited by HIPIMS: A preliminary study of erosion–corrosion performance

“…Ion current densities at the substrates (J s ) during the pretreatment were recorded in the Hauzer HTC1000-4 machine with a flat probe. Instruments] such as low angle Bragg-Brentano technique (2θ, 1°-10°) was used for bi-layer period measurement whereas glancing angle technique (2, 2θ, 20-100°) was used for stress analysis [12]. Surface morphology was studied by scanning electron microscopy (NOVANanoSEM).…”