2007
DOI: 10.1063/1.2721944
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Changes in surface topography of amorphous silicon germanium films after light soaking

Abstract: Light-induced metastable degradation of hydrogenated amorphous silicon and silicon germanium thin films (a-SiGe:H) is conjectured to be accompanied by structural changes but there has not been a direct measurement of the same. We measure the surface topography of these films in the annealed and the light soaked state using atomic force microscopy. We quantified the surface topography in terms of surface roughness and find that the surface roughness increases after light soaking. Our results provide direct evid… Show more

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Cited by 11 publications
(15 citation statements)
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“…8a) shows that during the first 40 min of light-soaking there is a strong decrease in the amplitude of ε 2 , which can be accounted by an increase of the surface roughness of the films (see Fig. 8e), consistent with published results [44] and AFM images (Figs. 4 and 5).…”
Section: Hydrogen Exodiffusion Studiessupporting
confidence: 80%
“…8a) shows that during the first 40 min of light-soaking there is a strong decrease in the amplitude of ε 2 , which can be accounted by an increase of the surface roughness of the films (see Fig. 8e), consistent with published results [44] and AFM images (Figs. 4 and 5).…”
Section: Hydrogen Exodiffusion Studiessupporting
confidence: 80%
“…In a-Si [16] and a-SiGe [13] the distribution of H is not uniform which causes local band gap variations, so-called elastic fluctuations of the band gap, the zones of less H content having the smaller band gap [13,16]. Voids where H has been released from Si (or Ge) atoms can be in our samples preferential sites where band gap fluctuations occur.…”
Section: Resultsmentioning
confidence: 94%
“…Based on the findings in the literature cited so far [1, and references therein] [3,5,[13][14][15][16] and on our recent ones [20] structural modifications have also to be expected in Si/Ge amorphous MLs made of ultrathin layers. By using atomic force microscopy (AFM) and transmission electron microscopy (TEM) this work will show that this is really the case.…”
Section: Introductionmentioning
confidence: 92%
“…If the voids are interconnected the a-Si:H very likely is not of the expected device grade quality since loss of H, by out-diffusion of atomic or molecular hydrogen, and possible in-diffusion of water and ambient molecules may occur depending on the void size (Beyer et al, 2012). Furthermore, the accumulation of the polyhydrides in (micro-)voids determines an inhomogeneous distribution of H that causes elastic potential fluctuations in the amorphous network resulting in a local variation in energy band gap (Agarwal et al, 2007). In particular, an increase of the optical band gap with increasing concentration of SiH 2 was observed (Manfredotti et al, 1994).…”
Section: Resultsmentioning
confidence: 97%