Change in water vapour adsorption kinetics in chemically vapour deposited SiO2 films after ion irradiation

Tseytlin, G.M.; Noskov, A.G.; Герасименко, Н. Н.; Stenin, S. I.

doi:10.1016/0040-6090(88)90266-0

Thin Solid Films

1988

DOI: 10.1016/0040-6090(88)90266-0

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Change in water vapour adsorption kinetics in chemically vapour deposited SiO2 films after ion irradiation

G.M. Tseytlin

A.G. Noskov

Н. Н. Герасименко

et al.

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Change in water vapour adsorption kinetics in chemically vapour deposited SiO2 films after ion irradiation

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References 6 publications

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