Challenges in using photosensitive embedding material to planarize multi-layer coils for actuator systems

Kohlmeier, T.; Gatzen, H.H.

doi:10.1016/s0304-8853(01)01303-8

Cited by 13 publications

(7 citation statements)

References 4 publications

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“…At the UH Nanofabrication Facility, immediately before applying SU-8, the pre-cleaned slides were rinsed with acetone (Sigma Aldrich) and deionized water and dried under a flow of clean nitrogen. Since the dryness of the substrate is a crucial prerequisite for the adhesion of SU-8 layer [21], the slides were kept at 140 • C for 10 min for complete dehydration before SU-8 deposition.…”

Section: Glass Slide Preparationmentioning

confidence: 99%

Bonding of SU-8 to glass for gastight picoliter reactors allowingin situoptical observation

Петрова¹,

Aich²,

Byington³

et al. 2013

J. Micromech. Microeng.

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Experimental tasks in chemistry and biology require large experiment statistics, small solution volumes, and no gas or vapor exchange with the environment. Microfluidics devices built of the epoxy-based polymer SU-8 comply with these requirements. However, the additional constraints of reactor thickness of several micrometers, localized temperature control, and optical access for high-resolution observation provide a challenge. We developed a device consisting of top and bottom glass plates separated by a layer of cross-linked SU-8, with a resistive microheater deposited at the bottom. Picoliter reactor volumes are achieved by suspending aqueous solution droplets in silicone oil held in a channel with cross-section 5 × 40 µm2. The narrow channels lead to large capillary resistance and, in turn, high injection pressures. To achieve bonding of SU-8 to glass capable of withstanding such pressures, we optimized the oxygen plasma treatment of the polymer surface by monitoring the evolution of the treated surface with atomic force microscopy. We found that the plasma effect was fully determined by its power. The hydrophilicity of the treated surfaces was characterized by their contact angles with water. The treated surfaces were bonded to glass bottoms using a torque-controlled clamp with a 3 µm smoothness of the holding plates. The bonding pressure and temperature were chosen in the gap between those for the glass transition of the SU-8 layer and fracture of the glass bottom.

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Section: Glass Slide Preparationmentioning

confidence: 99%

Bonding of SU-8 to glass for gastight picoliter reactors allowingin situoptical observation

Петрова¹,

Aich²,

Byington³

et al. 2013

J. Micromech. Microeng.

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“…For embedding the yoke, as well as all future layers of the microsensor, a photosensitive epoxy (SU-8) was applied. The SU-8 resist is well suited for creating layers of substantial thicknesses [5]- [7]. Exposing this resist to a postbake process yields results different from those of novolac-based resists: It becomes resistant to solvents and may be mechanically machined.…”

Section: A Sensor Fabricationmentioning

confidence: 99%

Eddy-current microsensor based on thin-film technology

Gatzen¹,

Andreeva²,

Iswahjudi³

2002

IEEE Trans. Magn.

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An eddy-current microsensor for proximity measurement was developed. To achieve an optimal design, the sensor was modeled using the finite-element method. By studying the sensor response, but staying within the technological boundaries, an optimal design was reached. The sensor had a soft-magnetic core and separate excitation and pickup coils. The fabrication technologies included electroplating for core and coil and sputter deposition for insulation and seed layers. Photoresists were used for creating micromolds for electroplating both core and coil, as well as for sensor embedding. Completed sensor samples had a frequency range of 100 kHz to 2 MHz and proved their capability of performing proximity measurement.

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“…[14] In addition, SU8 is well suited for building permanent electron-multiplying microstructures or for embedding and insulating metal flux guides and conductors. [15][16][17] SU8 has been used without being patterned in embedding applications, although it is further planarized by mechanical polishing. SU8 provides excellent abrasion resistance in these applications.…”

Section: Introductionmentioning

confidence: 99%

Kinetics of Cationic Photopolymerizations of UV‐Curable Epoxy‐Based SU8‐Negative Photoresists With and Without Silica Nanoparticles

Cho

Park

et al. 2006

Macro Materials & Eng

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Summary: This paper reports on the photocuring kinetics of protonic‐acid‐initiated cationic polymerizations of UV‐curable epoxy‐based SU8‐negative photoresist systems with and without silica nanoparticles, as assessed using photo‐DSC, FTIR spectroscopy, UV‐vis spectroscopy, and SEM. Photo‐DSC analysis using an autocatalytic kinetic model demonstrated that the cross‐link density and cure rate increased as the concentration of silica nanoparticles with surface silanol groups increased to 2.5 wt.‐%. This result was confirmed by FTIR spectroscopy, and suggests that the presence of silica nanoparticles of up to 2.5 wt.‐% promoted the cure conversion and cure rate of the UV‐curable hybrid organic/inorganic negative photoresists due to the synergistic effect of silica nanoparticles acting both as an effective flow or diffusion‐aid agent and as a proton‐donor cocatalyst during the cationic photopolymerization process. The decrease in the cross‐link density that occurred when the silica content was higher than 2.5 wt.‐% was attributed to aggregation between silica nanoparticles due to their high surface energy.SEM photograph at the film‐air interface of the UV‐cured hybrid organic/inorganic photoresist containing 10 wt.‐% silica nanoparticles.magnified imageSEM photograph at the film‐air interface of the UV‐cured hybrid organic/inorganic photoresist containing 10 wt.‐% silica nanoparticles.

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Challenges in using photosensitive embedding material to planarize multi-layer coils for actuator systems

Cited by 13 publications

References 4 publications

Bonding of SU-8 to glass for gastight picoliter reactors allowingin situoptical observation

Bonding of SU-8 to glass for gastight picoliter reactors allowingin situoptical observation

Eddy-current microsensor based on thin-film technology

Kinetics of Cationic Photopolymerizations of UV‐Curable Epoxy‐Based SU8‐Negative Photoresists With and Without Silica Nanoparticles

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