Challenges in the characterization of plasma polymers using XPS

Nisol, Bernard; Reniers, François

doi:10.1016/j.elspec.2015.05.002

Cited by 41 publications

(30 citation statements)

References 140 publications

(207 reference statements)

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“…Three small peaks are found in the binding energy range of 286–292 eV. The peak at 286.9 eV represents CO bonds that are probably associated with epoxy groups, formed from the reaction between vinyl groups and peroxy radicals . Ether groups generated during the addition of tert ‐butoxy radicals to vinyl moieties are also likely to contribute to broad peak at 286.9 eV.…”

Section: Resultsmentioning

confidence: 99%

Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing

Zhao

Wang

Gleason

2017

Adv Materials Inter

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Maintaining stable surface properties, such as wetting, remains a challenge for many applications of functional coatings. Here, this paper reports a study on the stability of the surface properties of polydivinylbenzene (PDVB). The PDVB thin films are synthesized via initiated chemical vapor deposition (iCVD). The decrease of receding water contact angles and increase of contact angle hysteresis of iCVD PDVB over time are found to be related with surface oxidation during air exposure. Fourier transform infrared and X‐ray photoelectron spectroscopy reveal the generation carbonyl and epoxy groups and the consumption of pendant vinyl groups in the oxidation process. A modified first‐order kinetic model describes the dynamic process, and the apparent reaction rate constant for the oxidation of iCVD PDVB is 0.0238–0.0294 h−1. In order to inhibit the oxidation and stabilize the wettability of iCVD PDVB, an in situ thermal annealing process is developed. This thermal treatment is effective in improving the cross‐linking degree of iCVD PDVB, slowing down the rate of oxidation, and therefore significantly enhancing the long‐term wettability. The advancing and receding contact angles of annealed iCVD PDVB are stable even after exposure to air for two months. The reported thermal annealing approach also improves the mechanical properties of iCVD PDVB.

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Section: Resultsmentioning

confidence: 99%

Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing

Zhao

Wang

Gleason

2017

Adv Materials Inter

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“…A representative high resolution C1s XPS spectrum of the cross-section of a 10 mm wide foam strip, after a deposition time of 30 min, is shown in Figure 4a, while curve-fitting results are reported in Table 1. The C1s signal is curve-fitted with the typical components ascribed to the fluorinated groups of a plasma-deposited fluorocarbon coating, [12,17,18] and specifically, the peaks at 286.8 AE 0. is also included (about 4% peak area) and could be due to both the underlying PU substrate and adventitious carbon. The possible substrate contribution to the C1s signal suggests that either the thickness of the deposited film is close to the sampling depth of XPS (4-10 nm) or that during sample preparation (i.e., sample cutting after plasma treatment) some untreated material was inevitably exposed and/or some damage of the coating occurred.…”

Section: Resultsmentioning

confidence: 99%

Thin Film Deposition on Open‐Cell Foams by Atmospheric Pressure Dielectric Barrier Discharges

Fanelli

Fracassi

2015

Plasma Processes & Polymers

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Thin films are deposited on open‐cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C3F6). During deposition processes, a foam substrate is sandwiched between the dielectric‐covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three‐dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X‐ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma‐treated foams under all explored experimental conditions.

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“…Spectra were acquired using an Mg anode (1,253.6 eV) operating at 300 W. The pass energy was set to 100 eV for survey spectra (not presented here), and 20 eV for high‐resolution (HR) C 1 s peak shape analysis. The HR C 1 s peak fitting was performed using CasaXPS (CasaSoftware Ltd), by considering the lowest number of physically meaningful components; for the sake of clarity, these were restricted to the “first neighbor”‐induced chemical shift (C–C/C–H, C–N/C‐O, C*‐CF x , C–F, C–F 2 ) . The FWHM (20 eV pass energy) of these components was constrained to 1.8 ± 0.1 eV, and binding energies were charge‐referenced by setting the hydrocarbon (C–C/C–H) component to 285.0 eV. …”

Section: Methodsmentioning

confidence: 99%

Energetics of reactions in a dielectric barrier discharge with argon carrier gas: VIII hydrofluoromethanes

Watson

Nisol

Wertheimer

2019

Plasma Processes & Polymers

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The method we have developed for understanding energetic exchanges between precursor molecules and argon (Ar) carrier gas in a dielectric barrier discharge (DBD) has much-proven merit. The present article focuses on hydrofluoromethanes, CH x F y . The precursors (‰ concentrations) were mixed with Ar in a 20 kHz, 8 kV (peak-to-peak) DBD. For each compound, E m , the energy absorbed per molecule, was plotted as a function of precursor flow rate. Besides the

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Challenges in the characterization of plasma polymers using XPS

Cited by 41 publications

References 140 publications

Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing

Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing

Thin Film Deposition on Open‐Cell Foams by Atmospheric Pressure Dielectric Barrier Discharges

Energetics of reactions in a dielectric barrier discharge with argon carrier gas: VIII hydrofluoromethanes

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