2016
DOI: 10.1021/acs.chemmater.6b01505
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Centimeter-Scale Synthesis of Ultrathin Layered MoO3 by van der Waals Epitaxy

Abstract: This is the post-peer reviewed version of the following article: A.J. Molina-Mendoza et al. "Centimeter-scale synthesis of ultrathin layered MoO3 by van der Waals epitaxy" Chem. Mater., 2016, 28 (11) ABSTRACTWe report on the large-scale synthesis of highly oriented ultrathin MoO3 layers using a simple and low-cost atmospheric pressure, van der Waals epitaxy growth on muscovite mica substrates. By this method we are able to synthetize high quality centimeter-scale MoO3 crystals with thicknesses ranging from 1.… Show more

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Cited by 110 publications
(122 citation statements)
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“…The bulk MoO 3 orthorhombic phase, has indirect band-gap of 2.2 eV as recently validated by experimental absorption spectra and theoretical data from PBEsol-vdW-D2 mehtod. 6 In our PBE+U/D3/SOC calculations with U O = 5 eV we obtain an indirect band-gap of 1.88 eV, about ~15% lower than the experimental one. On the other hand, the direct band-gap at Г-point is ~3.0 eV, which is quite close to to the optical absorption measurements which report a value of ~3.0-3.3 eV for this oxide.…”
Section: Band Gap and Electronic Structurementioning
confidence: 53%
“…The bulk MoO 3 orthorhombic phase, has indirect band-gap of 2.2 eV as recently validated by experimental absorption spectra and theoretical data from PBEsol-vdW-D2 mehtod. 6 In our PBE+U/D3/SOC calculations with U O = 5 eV we obtain an indirect band-gap of 1.88 eV, about ~15% lower than the experimental one. On the other hand, the direct band-gap at Г-point is ~3.0 eV, which is quite close to to the optical absorption measurements which report a value of ~3.0-3.3 eV for this oxide.…”
Section: Band Gap and Electronic Structurementioning
confidence: 53%
“…Due to the environmental sensitivity of 2D MoO 3 , device fabrication is difficult. As a result, transport properties of MoO 3 have only been reported in the published literature for thicknesses greater than 6 nm . An in situ low dose electron‐beam irradiation technique was developed to introduce oxygen vacancies controllably and quantifiably and to overcome these fabrication difficulties.…”
Section: Electron Irradiation‐induced Formation Of Few‐layer Moo3−xmentioning
confidence: 99%
“…It has an orthorhombic unit cell, with each Mo atom sitting in an octahedral environment of O atoms. It is an indirect gap semiconductor, even in the 2D form, with a gap between the conduction band at Γ and the valence band at M 77.…”
mentioning
confidence: 99%