“…From in situ XPS, Auger analysis, and temperature-programmed desorption curves, it has been concluded that, during MBE growth of CdTe on Si (211), the step-edge Si atoms remain unaffected even in the presence of an As flux while the terrace Si atoms are replaced by As. 11,12 We propose that a similar surface structure exists during our MOVPE growth, where the As atoms passivate the Ge terrace sites, causing the CdTe nucleation to begin at the step-edge sites, thus enabling step-flow growth and reducing twinning.…”