2000
DOI: 10.1007/s11664-000-0219-9
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CdZnTe heteroepitaxy on 3″ (112) Si: Interface, surface, and layer characteristics

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Cited by 57 publications
(48 citation statements)
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“…From in situ XPS, Auger analysis, and temperature-programmed desorption curves, it has been concluded that, during MBE growth of CdTe on Si (211), the step-edge Si atoms remain unaffected even in the presence of an As flux while the terrace Si atoms are replaced by As. 11,12 We propose that a similar surface structure exists during our MOVPE growth, where the As atoms passivate the Ge terrace sites, causing the CdTe nucleation to begin at the step-edge sites, thus enabling step-flow growth and reducing twinning.…”
Section: Resultsmentioning
confidence: 99%
“…From in situ XPS, Auger analysis, and temperature-programmed desorption curves, it has been concluded that, during MBE growth of CdTe on Si (211), the step-edge Si atoms remain unaffected even in the presence of an As flux while the terrace Si atoms are replaced by As. 11,12 We propose that a similar surface structure exists during our MOVPE growth, where the As atoms passivate the Ge terrace sites, causing the CdTe nucleation to begin at the step-edge sites, thus enabling step-flow growth and reducing twinning.…”
Section: Resultsmentioning
confidence: 99%
“…Step edge geometry of the (211) surface has advantage of having uniform energetically favorable nucleation sites [5,6] (Fig. 1).…”
Section: Mbe Growthmentioning
confidence: 99%
“…Therefore GaAs has been a very popular substrate for ZnTe growth by MBE [11,[13][14][15][16]. (2 1 1) is the major orientation for epitaxy of II-VI semiconductors such as CdTe or ZnTe on GaAs or Si [17][18][19] since these high index substrates provide a periodic array of energetically favourable sites at the surface as step edges formed by (1 0 0) crystal planes for initial nucleation in a uniform and regular fashion [20,21]. Additionally the twin defects could be suppressed effectively due to symmetry of the (2 1 1) surface [18] leading to a considerable improvement of crystalline quality [22].…”
Section: Introductionmentioning
confidence: 99%