Abstract:Control of circuit CD in a photolithographic process has become increasingly important, particularly for those advanced nodes below 45nm because it influences device performances greatly. The variation of circuit CD depends on many factors, for example, CD uniformity on reticles, focus, lens aberrations, partial coherence, photoresist performance and LASER spectral bandwidth. In this paper, we focus on LASER spectral bandwidth effects to reduce circuit CD variation. High-volume products of a leading technology… Show more
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