Cavity IEMP Enhancement by Dielectric Walls

Little, R.; Uglum, J.R.; Lowell, Robert

doi:10.1109/tns.1975.4328132

Cited by 8 publications

(1 citation statement)

References 5 publications

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“…One theory predicts surface breakdown due to charging of the tube wall by beam electrons. The ions generated during this process are accelerated toward the beam, neutralizing its space charge.11 The second theory predicts negative charging of the tube wall, while inducing repulsive 12,13 These fields return radially, diverging electrons back toward the beam axis. The latter hypothesis seems to most likely explain improved BLT beam transport characteristics through dielectric tubes.…”

Section: Beam Collimationmentioning

confidence: 99%

Pulsed electron-beam source for high-resolution high-throughput microlithography

et al. 1994

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Research and development of a broad area (> 1 cm diameter), high brightness (-107 A/cm2 rad2), high current density (>50 A/cm2), pulsed electron beam source for high throughput, high resolution (< 0.25 tim) lithography is reported. This novel electron beam source is simple, robust, will cost significantly less than direct write electron beam systems, and allows for high throughput pattern generation (>30 2-3' wafers/hr.). The electron beam is produced by the Back-Lighted Thyratron (BLT) and is transported through a dielectric tube to achieve focusing and collimation. Replication of 10 jtm line structures in PMMA using a nickel grid mask has been achieved. At present, masks comprising of diamond thin film (1-1 .5 tim) membranes on a silicon substrate are being fabricated to study the replication of submicrometer structures in PMMA. In this case, of primary importance are mask heating and deformation. Experiments indicate that the average surface temperature of the diamond thin film does not rise more than 5 K after being irradiated with the electron beam for tens of thousands of pulses at frequencies up to 5 Hz. Theoretical calculations indicate that the instantaneous temperature rise is also negligible (< 60 K).

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Section: Beam Collimationmentioning

confidence: 99%

Pulsed electron-beam source for high-resolution high-throughput microlithography

et al. 1994

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Enhancement of vacuum transmission of intense electron beam through cusp magnetic field using dielectric drift tubes

John

Jain

1981

Pramana - J Phys

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Intense electron-beam propagation in a dielectric guide

Greenwald

1979

Journal of Applied Physics

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Intense electron-beam propagation in a dielectric guide, without external magnetic fields, has been studied for 30-1oo-keV beams with virzI. The electron beam was injected into an evacuated cavity lined by dielectric materials with a thickness exceeding the electron range. The beam did not propagate until it was charge neutralized by ions removed from the dielectric following surface flashover caused by electron bombardment. The charge transported was a linear function of the cylindrical guide length, and the beam could be focused by a conical guide. Transport efficiency was reduced for dielectrics made ofSi0 2 compared to various plastics.

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Cavity IEMP Enhancement by Dielectric Walls

Cited by 8 publications

References 5 publications

Pulsed electron-beam source for high-resolution high-throughput microlithography

Pulsed electron-beam source for high-resolution high-throughput microlithography

Enhancement of vacuum transmission of intense electron beam through cusp magnetic field using dielectric drift tubes

Intense electron-beam propagation in a dielectric guide

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