1997
DOI: 10.1063/1.120257
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Cathodoluminescence study of laser recrystallized CdTe layers

Abstract: CdTe͑100͒/GaAs͑100͒ and CdTe͑111͒/CdTe͑111͒ layers grown by metalorganic vapor phase epitaxy ͑MOVPE͒ were investigated. The layers were recrystallized to improve their morphology by scanning the surface with a 100 m diameter spot from an Ar ion laser beam ( ϭ514.4 nm). Cathodoluminescence spectra from both as-grown and recrystallized CdTe MOVPE layers are used to monitor the effect of the recrystallization procedure. The laser recrystallization results in important changes on the spectral distribution of lumin… Show more

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Cited by 9 publications
(7 citation statements)
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“…This peculiarity, which is better seen on a nanoscale (Fig. 2b), suggests that some post-growth processing could be required to improve the crystalline quality of these structures, such as, e.g., laserassisted recrystallization, used previously for CdTe planar epitaxial layers [19][20][21]. Fig.…”
Section: Resultsmentioning
confidence: 92%
“…This peculiarity, which is better seen on a nanoscale (Fig. 2b), suggests that some post-growth processing could be required to improve the crystalline quality of these structures, such as, e.g., laserassisted recrystallization, used previously for CdTe planar epitaxial layers [19][20][21]. Fig.…”
Section: Resultsmentioning
confidence: 92%
“…[7][8][9][10]), vapor-phase epitaxy (VPE) on InSb substrates seems to be a perspective approach to grow CdTe nanostructures. This is because several important technological advantages such as the almost perfect lattice mismatch (0.04%) in CdTe/InSb heterosystem, the possibility for using InSb-based buffer layers formed on large-area GaAs substrates, the possibility for carrying out the VPE process at very low temperature (e.g.…”
Section: Introductionmentioning
confidence: 99%
“…Most recently, the development of X-ray detectors has focused on high atomic number ('high-Z') semiconductors, in particular wide bandgap semiconductors of the type II-VI such as CdTe and Cd(Zn)Te [2][3][4]. Epitaxial growth of these semiconductor compounds is strongly limited by the lack of commercial available lattice matched substrates [5,6]. Therefore, focus is necessarily shifting toward the fabrication of artificial substrates suitable for the selective area epitaxy of high-Z compound semiconductors.…”
Section: Introductionmentioning
confidence: 99%