2010
DOI: 10.1143/jjap.49.100201
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Catalytic Activation of Mg-Doped GaN by Hydrogen Desorption Using Different Metal Thin Layers

Abstract: The annealing of Mg-doped GaN with Pt and Mo layers has been found to effectively improve the hole concentration of such material by more than 2 times as high as those in the same material without metal. Compared with the Ni and Mo catalysts, Pt showed good activation effect for hydrogen desorption and ohmic contact to the Ni/Au electrode. Despite the weak hydrogen desorption, Mo did not diffuse into the GaN epilayer in the annealing process, thus suppressing the carrier compensation phenomenon with respect to… Show more

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Cited by 6 publications
(3 citation statements)
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“…As H i þ is mobile, all the H i þ atoms diffuse out at temperatures above 700 C. For the HSE barriers, the dissociation of Mg-H occurs at a higher temperature of around 300 C, and the annealing temperature for complete out-diffusion increases to 800 C. The calculated annealing temperatures agree well with the temperature range of 700-800 C, which are usually used in experiments. 2,[5][6][7]9) The zero point energy of H can reduce the migration barrier by about 0.1 eV. 10) We note that the correction of about 0.1 eV to the energy barriers reduces the annealing temperature by about 50-100 C. In addition, we find that the annealing temperature is affected by the initial Mg-H concentration.…”
mentioning
confidence: 63%
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“…As H i þ is mobile, all the H i þ atoms diffuse out at temperatures above 700 C. For the HSE barriers, the dissociation of Mg-H occurs at a higher temperature of around 300 C, and the annealing temperature for complete out-diffusion increases to 800 C. The calculated annealing temperatures agree well with the temperature range of 700-800 C, which are usually used in experiments. 2,[5][6][7]9) The zero point energy of H can reduce the migration barrier by about 0.1 eV. 10) We note that the correction of about 0.1 eV to the energy barriers reduces the annealing temperature by about 50-100 C. In addition, we find that the annealing temperature is affected by the initial Mg-H concentration.…”
mentioning
confidence: 63%
“…However, due to the large activation energies of Mg acceptors, [2][3][4] high doping levels and thermal annealing are commonly used to electrically activate Mg acceptors. [5][6][7][8] However, hole concentrations are still low, below 10 18 cm À3 , 7) and the doping efficiency is significantly reduced for high Mg concentrations. 8) In p-type GaN, an isolated hydrogen acts as an interstitial donor (H i þ ).…”
mentioning
confidence: 99%
“…It is generally thought that both crystal orientation and surface polarity play significant roles in the crystal quality and the performance of optoelectronic devices. Recently, there has been considerable work done on the non-/semipolar GaN materials and devices to eliminate or reduce the polarization fields, enhance the radiative efficiency and carrier transport. The in-plane crystal asymmetry of non-/semipolar III-nitride materials could be exploited to enhance the intrinsic polarization sensitivity so as to develop its potential application, such as the polarization-sensitive photodetectors (PSPD). ,, …”
Section: Introductionmentioning
confidence: 99%