Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template

Khanis, Noor Hamizah; Ritikos, Richard; Othman, Maisara; Rashid, Nur Maisarah Abdul; Gani, Siti Meriam Ab.; Rahman, Saadah Abdul

doi:10.1016/j.matchemphys.2012.12.012

Cited by 10 publications

(8 citation statements)

References 19 publications

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“…Another used technique consists of the doping of the film with different elements, such as boron, fluorine and nitrogen, which has been widely used to relieve the internal stress of the film [14][15][16].The effects of the nitrogen incorporating in DLC film is the reduction of the internal stress due to the decrease in the formation of carbon atoms with sp 3 hybridization. As a consequence, the film hardness is reduced and the DLC film adhesion on the substrate is facilitated, arousing interest in synthesis and application of these films [15][16][17][18][19][20][21]67].The production of DLC and N-DLC films by plasma enhanced chemical vapor deposition (PECVD) technique comes as a potential alternative of a surface treatment since it presents a relatively low cost, clean technology and formation of the homogeneous and uniform film [9,22]. This technique is being the focus of research for DLC film formation in Ti 6 Al 4 V alloy for space application [23], for application of DLC film in 316L stainless steel to act as anti-bactericidal agent in biomedical device [24], used to produce DLC film on inner surface of a long stainless steel tube [25], used to show the beneficial effects on the increased electrochemical activity of the DLC film doped with nitrogen [16,26] and to investigate the lubricating effect of the DLC film doped with nitrogen deposited on 3024 stainless steel to improve the tribocorrosion properties of the studied material [27].Since nitrogen is a low cost and environmentally friendly gas, it could be used to modify the undesirable properties of the DLC film, maintaining the high hardness and low coefficient of friction characteristic of the a-C:H films.…”

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confidence: 99%

“…The effects of the nitrogen incorporating in DLC film is the reduction of the internal stress due to the decrease in the formation of carbon atoms with sp 3 hybridization. As a consequence, the film hardness is reduced and the DLC film adhesion on the substrate is facilitated, arousing interest in synthesis and application of these films [15][16][17][18][19][20][21]67].…”

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confidence: 99%

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Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Almeida

Souza

Costa

et al. 2020

Mater. Res. Express

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The great interest in the study of diamond-like carbon films (a-C:H) is justified by its mechanical and tribological properties. However, the high internal stress of the film results in its difficult adhesion to the metallic substrate, which can be solved by nitrogen incorporation in the a-C:H film, allowing a formed film of lower internal stress. The objective of this work is to evaluate the influence of flow (20, 30 and 40sccm), CH 4 /Ar ratio (90/10 and 70/30) and voltage (400, 500, 600 and 700 V) in the a-C:H formation. For the best condition of the film, we studied the effect of nitrogen incorporation in the hardness and wear resistance of the a-C:H(N), modifying the nitrogen percentage in the treatment at 10% to 60% N 2 . The treatments were carried out in the Ti 6 Al 4 V substrate by DC-PECVD for two hours. For good adhesion of the films on the substrate, a silicon interlayer must be produced. The increase in the voltage above 600 V increases the I D /I G and film thickness, causing its delamination, and the gas ratio did not influence the a-C:H characteristics. The a-C:H film deposited with 30 sccm, 90/10 and 500 V was characterized as a-C:H (hard), with properties such as the hardness of 17 GPa, 30% H, 39% sp 3 and I D /I G ratio of 0.58. Since nitrogen reduced the deposition rate, the total gas flow for the production of a-C:H(N) was performed with 40 sccm. The Raman spectra of a-C:H(N) films showed changes in D band intensity and displacement in relation to the nitrogen-free film spectrum, evidencing the incorporation of nitrogen in the film. The XPS analysis showed the linear increase of the nitrogen incorporation in the a-C:H(N) film with the increase of the amount of the N 2 gas in the treatment, which caused, in general, a decrease in the amount of C-C sp 3 bonding, increasing the adhesion of the film in the substrate and not necessarily the low wear resistance of the formed film.According to Robertson [4] the DLC film that presents hydrogen concentrations between 30 and 50% receives the nomenclature of hydrogenated amorphous carbon (a-C:H), and presents lower hardness and internal stress than ta-C, facilitating the adhesion process of the film in the metallic substrates. This occurs due to sp 2 bonds formed in detriment of sp 3 bonds.The DLC films have been used in a variety of applications due to their notable properties, as protective coatings against wear and corrosion, in optical windows (optical filters), data storage hard drives, high performance automotive parts, coatings for biomedical products and electromechanical microdevices [9][10][11][12].However, as reported by Chen et al [13] and confirmed by Cemin et al [11], the high intrinsic compressive stress of the film, the high variation of the elastic coefficient, the difference in thermal expansion and the low chemical affinity between DLC and substrate difficult the adhesion process of the DLC film mainly when deposited on metallic surfaces. Thus, the use of techniques as oxide layer removal and the use of film interlayer previously to ...

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confidence: 99%

mentioning

confidence: 99%

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Almeida

Souza

Costa

et al. 2020

Mater. Res. Express

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“…Maka, berlaku peningkatan kadar pemendapan. Hasil kajian yang sama turut diperoleh oleh penyelidik lain (Khanis et al 2013) iaitu berlaku peningkatan kadar pemendapan apabila kuasa RF ditingkatkan. Dalam kajian ini, peningkatan kuasa RF menyebabkan pembentukan radikal C-N dan peningkatan penceraian gas dalam plasma.…”

Section: Kaedah Uji Kajiunclassified

“…Dalam teknik PECVD, penggabungan nitrogen dalam filem boleh dipengaruhi oleh perubahan kuasa RF disebabkan penjanaan plasma yang berbeza (Khanis et al 2013). Dalam kajian kami yang lepas, filem nipis a-CN x menunjukkan keamatan ikatan kimia meningkat apabila kuasa RF bertambah .…”

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Kesan Kuasa Frekuensi Radio terhadap Komposisi Ikatan Kimia Filem Nipis a-CNx sebagai Pengesan Kelembapan

Aziz

Awang²

2017

JSM

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“…There are many techniques to synthesis a-CN x thin films such as cyclic nitrogen radical sputtering [7], magnetron sputtering [3,8], PECVD [2,[9][10][11], and plasma assisted pulsed laser deposition [12]. Among these techniques, PECVD has been adored by many researchers.…”

Section: Introductionmentioning

confidence: 99%

Influence of deposition time on the chemical bonding and composition of amorphous carbon nitride films

Azman¹,

Awang²,

Kamal³

2014

AIP Conference Proceedings

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Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template

Cited by 10 publications

References 19 publications

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Kesan Kuasa Frekuensi Radio terhadap Komposisi Ikatan Kimia Filem Nipis a-CNx sebagai Pengesan Kelembapan

Influence of deposition time on the chemical bonding and composition of amorphous carbon nitride films

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Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template

Cited by 10 publications

References 19 publications

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti6Al4V substrate

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti6Al4V substrate

Kesan Kuasa Frekuensi Radio terhadap Komposisi Ikatan Kimia Filem Nipis a-CNx sebagai Pengesan Kelembapan

Influence of deposition time on the chemical bonding and composition of amorphous carbon nitride films

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Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate

Effect of nitrogen in the properties of diamond-like carbon (DLC) coating on Ti₆Al₄V substrate