1993
DOI: 10.1063/1.110542
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Carrier lifetime versus anneal in low temperature growth GaAs

Abstract: The photoexcited carrier lifetimes in ex situ-annealed low temperature growth GaAs are measured with a femtosecond transient absorption experiment. The study encompassed two low temperature growth GaAs films with approximately 0.3% and 0.9% excess arsenic incorporated during growth. The observed lifetimes are found to be a function of the spacing of arsenic precipitates formed during the 30 s anneals to temperatures between 650 and 1000 "C!. The carrier lifetime for unannealed films was found to be less than-2… Show more

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Cited by 169 publications
(86 citation statements)
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“…By annealing the material, arsenic clusters are formed [31]which act as efficient traps for photo-induced carriers. Carrier lifetimes shorter than 500 fs can be achieved with this method [32][33][34]Similarly short carrier lifetimes can also be achieved with erbium nano islands embedded in GaAs [35]. Generally, there is a trade-off between optimally short carrier lifetimes and increased parasitic dark current leading to premature breakdown of the material.…”
Section: 2materials Considerationsmentioning
confidence: 96%
“…By annealing the material, arsenic clusters are formed [31]which act as efficient traps for photo-induced carriers. Carrier lifetimes shorter than 500 fs can be achieved with this method [32][33][34]Similarly short carrier lifetimes can also be achieved with erbium nano islands embedded in GaAs [35]. Generally, there is a trade-off between optimally short carrier lifetimes and increased parasitic dark current leading to premature breakdown of the material.…”
Section: 2materials Considerationsmentioning
confidence: 96%
“…In postgrowth annealed LT GaAs, As precipitates of a few nm in diameter nucleate. 5 The density of precipitates and point defects can be tailored with T g and T a and hence the electronic and optic properties can differ largely as a function of these temperatures. Two competing models have been proposed for explaining the properties of LT GaAs.…”
mentioning
confidence: 99%
“…Поэтому при оптическом возбуждении структуры LT-GaAs способны генерировать пикосекундные (и более короткие) электрические импульсы, имеющие спектральный максимум в THz-области [3]. В большинстве исследований по созданию LT-GaAs [4,5] постросто-вый отжиг проводится в in situ в камере эпитаксиальной установки при температурах до 600…”
Section: поступило в редакцию 3 июля 2017 гunclassified